SCHEMBL25844745

SCHEMBL25844745

CC(C)(I)C(=O)OC1C2CC3C1OC(=O)C3C2C(=O)OC(CS(=O)(=O)O)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25844741 0.93 — —
SCHEMBL25781628 0.93 — —
SCHEMBL25844947 0.91 — —
SCHEMBL19396605 0.90 HMGCR (0.31) —
SCHEMBL19396600 0.88 — —
SCHEMBL23963411 0.85 — —
SCHEMBL19961461 0.84 — —
SCHEMBL25844945 0.84 — —
SCHEMBL25844748 0.84 — —
SCHEMBL19700525 0.83 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11709426-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-25 — — US disclosed
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