SCHEMBL25879082

SCHEMBL25879082

C=C(C)C(=O)OC(CCO)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.36
ALDH1A1 P00352 1/20 0.34
MGLL Q99685 1/20 0.32
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10265726 0.85 TSHR (0.38) TSHRALDH1A1THRB
SCHEMBL16553065 0.83 TSHR (0.42) TSHRALDH1A1THRB
SCHEMBL12360945 0.81 TSHR (0.38) TSHRALDH1A1THRB
SCHEMBL8375972 0.81 TSHR (0.38) TSHRALDH1A1THRB
SCHEMBL1419275 0.81 TSHR (0.45) TSHR
SCHEMBL17078640 0.80 TSHR (0.47) TSHR
SCHEMBL4236445 0.80 TSHR (0.47) TSHR
SCHEMBL4773863 0.80 TSHR (0.47) TSHR
SCHEMBL10678707 0.80 TSHR (0.47) TSHR
SCHEMBL9650012 0.79 TSHR (0.53) TSHRALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023140191-A1 ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD 富士フイルム株式会社 2023-07-27 WO disclosed