⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17717631 | 0.85 | — | — | |
| SCHEMBL21882096 | 0.85 | — | — | |
| SCHEMBL16284813 | 0.78 | — | — | |
| SCHEMBL234006 | 0.75 | — | — | |
| SCHEMBL16284809 | 0.73 | — | — | |
| SCHEMBL21882117 | 0.73 | — | — | |
| SCHEMBL22674150 | 0.73 | — | — | |
| SCHEMBL21882090 | 0.71 | — | — | |
| SCHEMBL21882089 | 0.71 | — | — | |
| SCHEMBL19708080 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1240 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260123302-A1 | METHOD AND APPARATUS FOR DEPOSITING A CARBON-CONTAINING MATERIAL | ASM IP HOLDING BV (NL) | 2026-04-30 | — | — | US | claimed |
| US-12518966-B2 | Selective plasma enhanced atomic layer deposition | VERSUM MATERIALS US, LLC (US) | 2026-01-06 | — | — | US | claimed |
| US-12435416-B2 | Compositions and methods using same for non-conformal deposition of silicon containing films | VERSUM MATERIALS US, LLC (US) | 2025-10-07 | — | — | US | claimed |
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | claimed |
| US-20250270698-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | VERSUM MATERIALS US, LLC | 2025-08-28 | — | — | US | claimed |
| US-20250160174-A1 | DISPLAY DEVICE AND METHOD OF FABRICATION FOR THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2025-05-15 | — | — | US | claimed |
| CN-119900018-A | Composition for high temperature atomic layer deposition of high quality silicon oxide films | 弗萨姆材料美国有限责任公司 | 2025-04-29 | — | — | CN | claimed |
| EP-4493734-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | Versum Materials US, LLC (US) | 2025-01-22 | — | — | EP | claimed |
| CN-119213168-A | Boron-containing precursors for ALD deposition of boron nitride films | 弗萨姆材料美国有限责任公司 | 2024-12-27 | — | — | CN | claimed |
| US-20240047196-A1 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | VERSUM MAT US LLC (US) | 2024-02-08 | — | — | US | claimed |
| EP-0586860-A2 | Photoresist composition and process for forming a pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 1994-03-16 | — | — | EP | claimed |
| EP-0540084-A1 | Method for passivating the inner surface of a reactor subject to coking, by deposition of a ceramic coating, and method of pyrolyzing hydrocarbons | ENICHEM S.p.A. (IT) | 1993-05-05 | — | — | EP | claimed |
| US-5208069-A | Silane precursor | ISTITUTO GUIDO DONEGANI S.P.A. (IT) | 1993-05-04 | — | — | US | claimed |
| US-4931351-A | Bilayer lithographic process | EASTMAN KODAK COMPANY (US) | 1990-06-05 | — | — | US | claimed |
| US-4912242-A | Process for preparing silicon esters | DOW CORNING CORPORATION (US) | 1990-03-27 | — | — | US | claimed |
| EP-0274757-A2 | Bilayer lithographic process | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1988-07-20 | — | — | EP | claimed |
| US-4412874-A | Silane ballistic modifier containing propellant | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY (US) | 1983-11-01 | — | — | US | claimed |
| US-4379067-A | Self-sealing refrigerant | Packo, Joseph J. (US) | 1983-04-05 | — | — | US | claimed |
| US-4304805-A | Sealing leaks by polymerization of volatilized aminosilane monomers | Packo, Joseph J. (US) | 1981-12-08 | — | — | US | claimed |
| US-4237172-A | Sealing leaks by polymerization of volatilized aminosilane monomers | Packo, Joseph J. (US) | 1980-12-02 | — | — | US | claimed |