SCHEMBL259182

SCHEMBL259182

[Al+3].[Mo+6].[N-3].[N-3].[N-3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16632113 0.87
SCHEMBL10578755 0.82
SCHEMBL16037 0.82
SCHEMBL8849452 0.82
SCHEMBL4865213 0.82
SCHEMBL8844858 0.82
SCHEMBL7973038 0.82
SCHEMBL35987 0.82
SCHEMBL18886767 0.82
SCHEMBL1238193 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 531 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115938925-A Preparation method of metal gate structure 联合微电子中心有限责任公司 2023-04-07 CN claimed
US-20230074307-A1 SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-03-09 US claimed
CN-109037317-B Ferroelectric memory device 爱思开海力士有限公司 2021-09-10 CN claimed
US-10475924-B2 Ferroelectric memory devices SK Hynix Inc. (KR) 2019-11-12 US claimed
US-20180358471-A1 FERROELECTRIC MEMORY DEVICES SK Hynix Inc. (KR) 2018-12-13 US claimed
US-9466660-B2 Semiconductor structures including molybdenum nitride, molybdenum oxynitride or molybdenum-based alloy material, and method of making such structures MICRON TECHNOLOGY, INC. (US) 2016-10-11 US claimed
US-9263539-B2 Thin-film transistor and fabrication method thereof, array substrate and display device BOE TECHNOLOGY GROUP CO., LTD (CN) 2016-02-16 US claimed
CN-104829984-A Teflon-based low-heat resistance heat radiation material for LED light source and preparation method thereof ANHUI BO CHANG ELECTRONIC POLYTRON TECHNOLOGIES INC 2015-08-12 CN claimed
US-20150194498-A1 THIN-FILM TRANSISTOR AND FABRICATION METHOD THEREOF, ARRAY SUBSTRATE AND DISPLAY DEVICE BOE TECHNOLOGY GROUP CO., LTD. (CN) 2015-07-09 US claimed
US-20150187841-A1 Method of forming current-programmable inline resistor INTERMOLECULAR INC. (US) 2015-07-02 US claimed
US-20060148125-A1 Phase changable memory device structures HORII HIDEKI 2006-07-06 US claimed
US-20060118913-A1 Phase changeable memory cells and methods of forming the same SAMSUNG ELECTRONICS CO., LTD. 2006-06-08 US claimed
US-7037749-B2 Methods for forming phase changeable memory devices SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-05-02 US claimed
US-20060076641-A1 Methods of fabricating phase changeable semiconductor memory devices including multi-plug conductive structures and related devices SAMSUNG ELECTRONICS CO., LTD. 2006-04-13 US claimed
US-20060035429-A1 Methods of forming phase-change random access memories including a confined contact hole and integrated circuit devices including the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-02-16 US claimed
US-20050185444-A1 Phase-changeable memory device and method of manufacturing the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2005-08-25 US claimed
US-20050002227-A1 Phase changeable memory devices including nitrogen and/or silicon and methods for fabricating the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2005-01-06 US claimed
US-20040251551-A1 Phase changeable memory devices including carbon nano tubes and methods for forming the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-12-16 US claimed
US-20040183107-A1 Phase changable memory device structures and related methods SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-09-23 US claimed
US-20040165422-A1 Phase changeable memory devices and methods for fabricating the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-08-26 US claimed