Lithium Ion

Lithium Ion

SCHEMBL2593879

[Bi].[Bi].[Li+].[Li+].[O-2].[Te].[Te]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

GSK3AGSK3BIMPA1

The experimentally established mechanism targets of Lithium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Lithium Ion SCHEMBL11036323 0.87
Lithium Ion SCHEMBL2586998 0.75
Lithium Ion SCHEMBL29445506 0.71
SCHEMBL29929445 0.71
Lithium Ion SCHEMBL28778 0.71
SCHEMBL131183 0.71
Lithium Ion SCHEMBL23780277 0.58
Lithium Ion SCHEMBL492828 0.58
SCHEMBL7919470 0.58
Lithium Ion SCHEMBL21541938 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11158746-B2 Thick-film pastes containing lead-tellurium-lithium-oxides, and their use in the manufacture of semiconductor devices SOLAR PASTE, LLC (US) 2021-10-26 US disclosed
CN-107393623-B Composition for solar cell electrode and electrode manufactured using the same 三星SDI株式会社 2020-10-23 CN disclosed
US-10468542-B2 Thick-film pastes containing lead-tellurium-lithium-oxides, and their use in the manufacture of semiconductor devices DUPONT ELECTRONICS, INC. (US) 2019-11-05 US disclosed
US-10065882-B2 Composition for forming solar cell electrode and electrode fabricated using the same SAMSUNG SDI CO., LTD. (KR) 2018-09-04 US disclosed
US-20180062007-A1 THICK-FILM PASTES CONTAINING LEAD-TELLURIUM-LITHIUM- OXIDES, AND THEIR USE IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES E I DU PONT DE NEMOURS AND COMPANY (US) 2018-03-01 US disclosed
CN-107393623-A Composition for solar cel electrode and the electrode using its making 三星SDI株式会社 2017-11-24 CN disclosed
US-20170327410-A1 COMPOSITION FOR FORMING SOLAR CELL ELECTRODE AND ELECTRODE FABRICATED USING THE SAME CHANGZHOU FUSION NEW MATERIAL CO. LTD (CN) 2017-11-16 US disclosed
US-9722100-B2 Thick-film pastes containing lead-tellurium-lithium-oxides, and their use in the manufacture of semiconductor devices E I DU PONT DE NEMOURS AND COMPANY (US) 2017-08-01 US disclosed
CN-102971268-B Thick film pastes containing lead-tellurium-lithium-oxides and their use in the manufacture of semiconductor devices E·I·内穆尔杜邦公司 2017-06-06 CN disclosed
EP-2566826-B1 THICK-FILM PASTES CONTAINING LEAD-TELLURIUM-LITHIUM- OXIDES, AND THEIR USE IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES DU PONT (US) 2016-11-30 EP disclosed
US-8889980-B2 Thick-film pastes containing lead—tellurium—lithium—oxides, and their use in the manufacture of semiconductor devices E I DU PONT DE NEMOURS AND COMPANY (US) 2014-11-18 US disclosed
US-20130255770-A1 THICK-FILM PASTES CONTAINING LEAD-TELLURIUM-LITHIUM- OXIDES, AND THEIR USE IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES E I DU PONT DE NEMOURS AND COMPANY (US) 2013-10-03 US disclosed
EP-2566826-A1 THICK-FILM PASTES CONTAINING LEAD-TELLURIUM-LITHIUM- OXIDES, AND THEIR USE IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES E.I. Du Pont De Nemours And Company (US) 2013-03-13 EP disclosed
CN-102971268-A Thick film pastes containing lead-tellurium-lithium-oxides and their use in the manufacture of semiconductor devices DU PONT 2013-03-13 CN disclosed
US-20110308597-A1 THICK-FILM PASTES CONTAINING LEAD-TELLURIUM-LITHIUM- OXIDES, AND THEIR USE IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES E. I. DU PONT DE NEMOURS AND COMPANY (US) 2011-12-22 US disclosed
WO-2011140192-A1 THICK-FILM PASTES CONTAINING LEAD-TELLURIUM-LITHIUM- OXIDES, AND THEIR USE IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES E. I. DU PONT DE NEMOURS AND COMPANY (US) 2011-11-10 WO disclosed