⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL19712682 | 0.73 | — | — | |
| SCHEMBL10782663 | 0.73 | — | — | |
| Bicarbonate SCHEMBL5865890 | 0.71 | — | — | |
| SCHEMBL9488849 | 0.69 | — | — | |
| SCHEMBL325393 | 0.67 | — | — | |
| Carbamic Acid SCHEMBL5865959 | 0.67 | — | — | |
| SCHEMBL10858221 | 0.65 | — | — | |
| SCHEMBL40262 | 0.65 | — | — | |
| Dibromoacetic Acid SCHEMBL1330871 | 0.63 | — | — | |
| Dibromoacetic Acid SCHEMBL137199 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11720020-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-08 | — | — | US | disclosed |
| US-11720020-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-08 | — | — | US | disclosed |