SCHEMBL25946757

SCHEMBL25946757

O=C(O)COCCOC(=O)CBr

nearest known ligand 0.47

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.45
ALDH1A1 P00352 4/20 0.43
TRPA1 O75762 2/20 0.43
TSHR P16473 5/20 0.38
HSD17B10 Q99714 2/20 0.34
BLM P54132 1/20 0.34
PMP22 Q01453 1/20 0.34
CTH P32929 1/20 0.32
CBS P35520 1/20 0.32
THPO P40225 1/20 0.32
FAAH O00519 1/20 0.32
TDP1 Q9NUW8 1/20 0.31
TP53 P04637 2/20 0.31
HIF1A Q16665 2/20 0.31
THRB P10828 1/20 0.31
PAM P19021 3/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15616858 0.84 CYP2C19 (0.56) CYP2C19L3MBTL1ALDH1A1TRPA1TSHR
SCHEMBL14273796 0.84 CYP2C19 (0.56) CYP2C19L3MBTL1ALDH1A1TRPA1TSHR
SCHEMBL1434603 0.81 CYP2C19 (0.64) CYP2C19L3MBTL1ALDH1A1TRPA1TSHR
Glycolic Acid SCHEMBL2390988 0.79 CYP2C19 (0.52) CYP2C19L3MBTL1ALDH1A1TRPA1TSHR
SCHEMBL9333897 0.79
SCHEMBL25946596 0.78 TSHR (0.32) ALDH1A1TSHRHSD17B10BLMPMP22
SCHEMBL22245274 0.78 GLRA1 (0.38) ALDH1A1TSHRHSD17B10BLMPMP22
SCHEMBL45305 0.78 TSHR (0.47) CYP2C19ALDH1A1TSHRHSD17B10BLM
SCHEMBL14134498 0.77 MEN1 (0.40) ALDH1A1TSHRHSD17B10CTHCBS
SCHEMBL1932585 0.77 MEN1 (0.40) ALDH1A1TSHRHSD17B10CTHCBS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed