Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | NAMPT | P43490 | 2/20 | 0.42 |
| ▸ | ACE | P12821 | 4/20 | 0.41 |
| ▸ | DDB1 | Q16531 | 1/20 | 0.39 |
| ▸ | CRBN | Q96SW2 | 1/20 | 0.39 |
| ▸ | UCHL1 | P09936 | 1/20 | 0.39 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.38 |
| ▸ | PRMT5 | O14744 | 2/20 | 0.38 |
| ▸ | WDR77 | Q9BQA1 | 2/20 | 0.38 |
| ▸ | GPR119 | Q8TDV5 | 1/20 | 0.38 |
| ▸ | DRD2 | P14416 | 1/20 | 0.38 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.38 |
| ▸ | ABHD6 | Q9BV23 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27393607 | 0.88 | MEN1 (0.45) | MEN1KMT2AMAPK1NAMPTACE | |
| SCHEMBL30944609 | 0.88 | MEN1 (0.45) | MEN1KMT2AMAPK1NAMPTACE | |
| SCHEMBL6482316 | 0.88 | ACE (0.54) | MEN1KMT2AMAPK1NAMPTACE | |
| SCHEMBL205299 | 0.88 | ACE (0.54) | MEN1KMT2AMAPK1NAMPTACE | |
| SCHEMBL5208845 | 0.88 | ACE (0.54) | MEN1KMT2AMAPK1NAMPTACE | |
| SCHEMBL30626775 | 0.88 | ACE (0.54) | MEN1KMT2AMAPK1NAMPTACE | |
| SCHEMBL31038337 | 0.88 | ACE (0.54) | MEN1KMT2AMAPK1NAMPTACE | |
| SCHEMBL25960310 | 0.87 | ACE (0.41) | MEN1KMT2ANAMPTACEABHD6 | |
| SCHEMBL25960276 | 0.87 | MEN1 (0.45) | MEN1KMT2AMAPK1NAMPTACE | |
| SCHEMBL6251794 | 0.86 | MEN1 (0.44) | MEN1KMT2AMAPK1NAMPTACE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230244149-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |