SCHEMBL259840

SCHEMBL259840

CCCCC(N)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1217342 1.00
SCHEMBL13374806 1.00
Water SCHEMBL27984729 0.97
Bromide SCHEMBL20499883 0.97
Butane SCHEMBL9869565 0.97 SPHK1 (0.46)
Hydrochloric Acid SCHEMBL3411949 0.97
SCHEMBL18342615 0.91 SPHK1 (0.58)
SCHEMBL16442 0.91
SCHEMBL1218442 0.91
SCHEMBL9801241 0.88 SPHK1 (0.62)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2060 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260124792-A1 CLEANING AGENT COMPOSITION, CLEANING MATERIAL, AND METHOD OF CLEANING MOLD FOR MOLDING RESONAC CORPORATION (JP) 2026-05-07 US claimed
WO-2025264382-A1 COLLECTOR COMPOSITION FOR ORE BENEFICIATION ArrMaz Products Inc. (US) 2025-12-26 WO claimed
EP-4667107-A1 COLLECTOR COMPOSITION FOR ORE BENEFICIATION ArrMaz Products Inc. (US) 2025-12-24 EP claimed
US-20250236820-A1 BIODEGRADABLE MICROCAPSULES WITH IMPROVED STORAGE STABILITY, PROCESS FOR PREPARING THE SAME AND METHOD OF USE THEREOF ISP INVESTMENTS LLC (US) 2025-07-24 US claimed
WO-2025131704-A1 WATER-BASED HYDRAULIC FLUIDS CLARIANT INTERNATIONAL LTD (CH) 2025-06-26 WO claimed
CN-120149531-A Composite in-situ solid electrolyte and secondary lithium battery 蓝固(常州)新能源有限公司 2025-06-13 CN claimed
US-12305079-B2 CMP slurry composition for polishing polycrystalline silicon and polishing method using same KCTECH CO., LTD. (KR) 2025-05-20 US claimed
WO-2025084639-A1 CONDUCTIVE MATERIAL DISPERSION FOR SECONDARY BATTERY AND SLURRY COMPOSITION FOR SECONDARY BATTERY ELECTRODE, COMPRISING SAME 신아티앤씨 2025-04-24 WO claimed
CN-119768260-A Cleaning agent composition, cleaning material, and method for cleaning molding die 株式会社力森诺科 2025-04-04 CN claimed
CN-119744220-A Cleaning agent composition, cleaning material, and method for cleaning molding die 株式会社力森诺科 2025-04-01 CN claimed
EP-0763754-A2 Photocured crosslinked-hyaluronic acid contact lens SEIKAGAKU KOGYO KABUSHIKI KAISHA (SEIKAGAKU CORPORATION) (JP) 1997-03-19 EP claimed
WO-1996038226-A1 CATALYST AND PROCESS FOR PRODUCING AMINES THE DOW CHEMICAL COMPANY (US) 1996-12-05 WO claimed
US-5520757-A Low vulnerability propellants ICI EXPLOSIVES USA INC. (US) 1996-05-28 US claimed
EP-0576445-B1 A COMPOSITION FOR USE IN WASHING AND CLEANSING VULCANIZATION MOLDS SAN MARTINO SPA (IT) 1996-05-15 EP claimed
WO-1992016346-A1 A COMPOSITION FOR USE IN WASHING AND CLEANSING VULCANIZATION MOLDS SILVANI ANTINCENDI S.P.A (IT) 1992-10-01 WO claimed
US-5059442-A Primary amide esters as low calorie fat mimetics NABISCO BRANDS, INC. (US) 1991-10-22 US claimed
US-5045338-A Ester imides, acylated aminoalcohol derivatives NABISCO BRANDS, INC. (US) 1991-09-03 US claimed
US-4759861-A Consists of an aliphatic mono- or di-carboxylic acid, a dimer or trimer of said dicarboxylic acid, petroleum sulfonic acid and naphthenic acid or salt NIPPON OIL CO., LTD. (JP) 1988-07-26 US claimed
US-4578436-A Coating resinous composition containing saturated alicyclic acid modified amphoteric polyester resin NIPPON PAINT CO., LTD. (JP) 1986-03-25 US claimed
US-4045204-A PULLULAN OR DERIVATIVE AS BINDER SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1977-08-30 US claimed