SCHEMBL260369

SCHEMBL260369

C=CS(=O)(=O)C(C)S(=O)(=O)C=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL410162 0.80
SCHEMBL10705953 0.78
SCHEMBL4775219 0.75
SCHEMBL10418342 0.75
SCHEMBL28143615 0.74 GRIA1 (0.30)
SCHEMBL453990 0.73
SCHEMBL11338046 0.71
SCHEMBL1289254 0.71
SCHEMBL10421527 0.71
SCHEMBL7901991 0.69 TP53 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 135 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119419365-A Multi-element deep eutectic electrolyte of lithium ion battery and preparation method thereof 昆明理工大学 2025-02-11 CN claimed
WO-2023065489-A1 HIGH DIELECTRIC COMPOUND AND PREPARATION METHOD THEREFOR, EPOXY HIGH DIELECTRIC MATERIAL AND PREPARATION METHOD THEREFOR, AND SEMICONDUCTOR DEVICE 中国科学院深圳先进技术研究院 2023-04-27 WO claimed
CN-114874121-A Method for preparing material containing monothiocarbonate group and product 浙江大学 2022-08-09 CN claimed
CN-113979902-B High-dielectric compound and preparation method thereof, epoxy high-dielectric material and preparation method thereof, and semiconductor device 中国科学院深圳先进技术研究院 2022-07-22 CN claimed
CN-113979902-A High-dielectric compound and preparation method thereof, epoxy high-dielectric material and preparation method thereof, and semiconductor device 中国科学院深圳先进技术研究院 2022-01-28 CN claimed
CN-119419365-A Multi-element deep eutectic electrolyte of lithium ion battery and preparation method thereof 昆明理工大学 2025-02-11 CN disclosed
CN-114874121-B Method for preparing substance containing monothiocarbonate group and product 浙江大学 2023-10-03 CN disclosed
CN-116355484-A Curable composition, cured film, organic electroluminescent element, and method for producing organic electroluminescent element JSR株式会社 2023-06-30 CN disclosed
WO-2023065489-A1 HIGH DIELECTRIC COMPOUND AND PREPARATION METHOD THEREFOR, EPOXY HIGH DIELECTRIC MATERIAL AND PREPARATION METHOD THEREFOR, AND SEMICONDUCTOR DEVICE 中国科学院深圳先进技术研究院 2023-04-27 WO disclosed
CN-114874121-A Method for preparing material containing monothiocarbonate group and product 浙江大学 2022-08-09 CN disclosed
CN-113979902-B High-dielectric compound and preparation method thereof, epoxy high-dielectric material and preparation method thereof, and semiconductor device 中国科学院深圳先进技术研究院 2022-07-22 CN disclosed
CN-113979902-A High-dielectric compound and preparation method thereof, epoxy high-dielectric material and preparation method thereof, and semiconductor device 中国科学院深圳先进技术研究院 2022-01-28 CN disclosed
EP-0174873-B1 SILVER HALIDE COLOR PHOTO-SENSITIVE MATERIAL KONICA CORPORATION (JP) 1988-11-17 EP disclosed
EP-0240852-A2 Silver halide photographic light-sensitive material KONICA CORPORATION (JP) 1987-10-14 EP disclosed
US-4695533-A PYRAZOLOTRIAZOLE MAGENTA COUPLER WITH SULFONE GROUP KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1987-09-22 US disclosed
US-4690888-A SLIGHTLY-DIFFUSABLE COLORED COMPOUNDS TO REACT WITH OXIDIZED DEVELOPERS; SHARPNESS KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1987-09-01 US disclosed
EP-0174873-A2 Silver halide color photo-sensitive material KONICA CORPORATION (JP) 1986-03-19 EP disclosed
US-4171976-A Homopolymerization inhibition of photographic hardeners EASTMAN KODAK COMPANY (US) 1979-10-23 US disclosed
US-4144070-A SUPERSENSITIZING DYES KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1979-03-13 US disclosed
US-RE29305-E HARDENABLE HYDROPHILIC COLLOIDS, PHOTOGRAPHY EASTMAN KODAK COMPANY (US) 1977-07-12 US disclosed