Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 8/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.47 |
| ▸ | TP53 | P04637 | 3/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.38 |
| ▸ | THRB | P10828 | 2/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Triethylene Glycol SCHEMBL138940 | 0.98 | TSHR (0.50) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Tetraethylene Glycol SCHEMBL6759628 | 0.98 | TSHR (0.50) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Ethylene Glycol SCHEMBL259569 | 0.87 | TSHR (0.48) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Ethylene Glycol SCHEMBL19331532 | 0.85 | TSHR (0.46) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Ethylene Glycol SCHEMBL9190021 | 0.85 | TSHR (0.46) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Ethylene Glycol SCHEMBL9184463 | 0.85 | TSHR (0.46) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Ethylene Glycol SCHEMBL9185421 | 0.85 | TSHR (0.46) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Di(Hydroxyethyl)Ether SCHEMBL11856454 | 0.83 | TSHR (0.56) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Ethylene Glycol SCHEMBL11752767 | 0.83 | TSHR (0.45) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Ethylene Glycol SCHEMBL138050 | 0.83 | TSHR (0.45) | TSHRALDH1A1TP53HIF1AHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 150 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3660111-B1 | INK COMPOSITION, METHOD FOR PRODUCING SAME, AND IMAGE FORMATION METHOD | FUJIFILM CORP (JP) | 2026-02-18 | — | — | EP | disclosed |
| US-12393130-B2 | Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus | CANON KABUSHIKI KAISHA (JP) | 2025-08-19 | — | — | US | disclosed |
| EP-4526365-A1 | ACRYLATE-EPOXY RESIN COMPOSITIONS | Lyondellbasell Composites LLC (US) | 2025-03-26 | — | — | EP | disclosed |
| US-20240300216-A1 | FILM-LAMINATED METAL SHEET AND METHOD OF PRODUCING THE SAME, SUBSTRATE FOR FLEXIBLE ELECTRONICS, AND ORGANIC EL SUBSTRATE | JFE STEEL CORPORATION (JP) | 2024-09-12 | — | — | US | disclosed |
| EP-3608376-B1 | INK COMPOSITION, PRODUCTION METHOD THEREFOR, AND IMAGE FORMATION METHOD | FUJIFILM CORP (JP) | 2024-09-11 | — | — | EP | disclosed |
| US-20240199847-A1 | RESIN COMPOSITION AND ELECTRONIC DEVICE | KONICA MINOLTA INC (JP) | 2024-06-20 | — | — | US | disclosed |
| US-11964359-B2 | Apparatus and method of forming a polishing article that has a desired zeta potential | APPLIED MATERIALS, INC. (US) | 2024-04-23 | — | — | US | disclosed |
| CN-115380087-B | Inkjet ink | 株式会社则武 | 2024-04-02 | — | — | CN | disclosed |
| CN-115315492-B | Inkjet ink | 株式会社则武 | 2024-04-02 | — | — | CN | disclosed |
| US-11939479-B2 | Ink jet ink composition, method for producing the same, and image-forming method | FUJIFILM CORPORATION (JP) | 2024-03-26 | — | — | US | disclosed |
| US-6077647-A | BACK PLATE FOR PLASMA DISPLAY PANEL | HITACHI CHEMICAL CO., LTD. (JP) | 2000-06-20 | — | — | US | disclosed |
| US-5900336-A | TWO KINDS OF CARBON | RICOH COMPANY, LTD. (JP) | 1999-05-04 | — | — | US | disclosed |
| US-5858616-A | Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1999-01-12 | — | — | US | disclosed |
| EP-0884754-A1 | METHOD AND DEVICE FOR MANUFACTURING PLASMA DISPLAY | TORAY INDUSTRIES, INC. (JP) | 1998-12-16 | — | — | EP | disclosed |
| EP-0785565-A1 | Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same | Hitachi Chemical Co., Ltd. (JP) | 1997-07-23 | — | — | EP | disclosed |
| EP-0768573-A1 | Phosphor-containing photosensitive resin composition for use in manufacturing plasma display panel | Hitachi Chemical Co., Ltd. (JP) | 1997-04-16 | — | — | EP | disclosed |
| US-4686166-A | HIGH IMAGE DENSITY, ANTIFOGGING AGENT | HITACHI CHEMICAL CO. (JP) | 1987-08-11 | — | — | US | disclosed |
| US-4501689-A | CONTAINING PYRIDINE OR IMIDAZOLE MODIFIED 5-TRIAZINE | TAMURA KAKEN CO., LTD. (JP) | 1985-02-26 | — | — | US | disclosed |
| US-4388395-A | DISPERSION OF TONER AND RESIN IN DIELECTRIC CARRIER | RICOH CO., LTD. (JP) | 1983-06-14 | — | — | US | disclosed |
| US-4205018-A | COATINGS | SOMAR MANUFACTURING CO., LTD. (JP) | 1980-05-27 | — | — | US | disclosed |