SCHEMBL26164281

SCHEMBL26164281

c1ccc(-c2ccc(N(c3ccc(-c4ccccc4)cc3)c3cccc4c3Oc3ccc(-c5nc(-c6ccccc6)nc(-c6ccccc6)n5)c5cccc-4c35)cc2)cc1

nearest known ligand 0.32

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.32
ALDH1A1 P00352 2/20 0.32
MAPT P10636 2/20 0.32
HPGD P15428 2/20 0.32
TSHR P16473 2/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
TP53 P04637 1/20 0.32
NFKB1 P19838 1/20 0.32
MAPK1 P28482 1/20 0.32
NFKB2 Q00653 1/20 0.32
RELA Q04206 1/20 0.32
ATM Q13315 1/20 0.32
HSD17B10 Q99714 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
KDM1A O60341 1/20 0.31
LMNA P02545 1/20 0.31
CYP1A2 P05177 1/20 0.31
GLA P06280 1/20 0.31
CYP3A4 P08684 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26164280 0.99 KDM4E (0.31) KDM4EALDH1A1MAPTHPGDTSHR
SCHEMBL26164279 0.96 TSHR (0.33) KDM4EALDH1A1MAPTHPGDTSHR
SCHEMBL26164300 0.95 USP2 (0.30) HSD17B10LMNACYP1A2CYP3A4CYP2D6
SCHEMBL26164298 0.91
SCHEMBL26164301 0.90 HSD17B10 (0.33) KDM4EALDH1A1MAPTHPGDTSHR
SCHEMBL26164303 0.89 KDM1A (0.33) KDM4EALDH1A1MAPTHPGDTSHR
SCHEMBL26164302 0.88 TSHR (0.32) KDM4EALDH1A1MAPTHPGDTSHR
SCHEMBL26164358 0.87 KDM1A (0.33) KDM4EALDH1A1MAPTHPGDTSHR
SCHEMBL26164354 0.87 KDM1A (0.33) KDM4EALDH1A1MAPTHPGDTSHR
SCHEMBL25915402 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023096225-A1 HETEROCYCLIC COMPOUND, AND ORGANIC LIGHT-EMITTING DEVICE AND COMPOSITION FOR FORMING ORGANIC MATERIAL LAYER, COMPRISING SAME 엘티소재주식회사 2023-06-01 WO disclosed