Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2623638 | 1.00 | TDP1 (0.52) | TDP1HSD17B10MAPK1 | |
| SCHEMBL2623609 | 0.96 | TDP1 (0.57) | TDP1HSD17B10MAPK1 | |
| SCHEMBL2623612 | 0.96 | TDP1 (0.57) | TDP1HSD17B10MAPK1 | |
| SCHEMBL2623634 | 0.94 | TDP1 (0.59) | TDP1HSD17B10MAPK1 | |
| SCHEMBL2623626 | 0.89 | TDP1 (0.40) | TDP1 | |
| SCHEMBL2623625 | 0.89 | TDP1 (0.40) | TDP1 | |
| SCHEMBL2623643 | 0.89 | TDP1 (0.40) | TDP1 | |
| SCHEMBL10021836 | 0.87 | TDP1 (0.65) | TDP1HSD17B10MAPK1 | |
| SCHEMBL250892 | 0.84 | TDP1 (0.68) | TDP1HSD17B10MAPK1 | |
| SCHEMBL811380 | 0.84 | TDP1 (0.68) | TDP1HSD17B10MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8158981-B2 | Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-04-17 | — | — | US | disclosed |
| US-20100102321-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COATING FILM, SILICA-BASED COATING FILM, APPARATUS AND MEMBER HAVING SILICA-BASED COATING FILM AND PHOTOSENSITIZING AGENT FOR INSULATING FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-04-29 | — | — | US | disclosed |