⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2623614 | 0.98 | TDP1 (0.31) | — | |
| SCHEMBL2623605 | 0.98 | TDP1 (0.31) | — | |
| SCHEMBL2623631 | 0.94 | TDP1 (0.31) | — | |
| SCHEMBL2623608 | 0.94 | TDP1 (0.31) | — | |
| SCHEMBL2623621 | 0.86 | MAPK1 (0.33) | — | |
| SCHEMBL2623636 | 0.86 | MAPK1 (0.33) | — | |
| SCHEMBL2623618 | 0.86 | MAPK1 (0.33) | — | |
| SCHEMBL15170 | 0.86 | MAPK1 (0.33) | — | |
| SCHEMBL2623601 | 0.83 | — | — | |
| SCHEMBL2623639 | 0.81 | MAPK1 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8158981-B2 | Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-04-17 | — | — | US | disclosed |
| US-20100102321-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COATING FILM, SILICA-BASED COATING FILM, APPARATUS AND MEMBER HAVING SILICA-BASED COATING FILM AND PHOTOSENSITIZING AGENT FOR INSULATING FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-04-29 | — | — | US | disclosed |