SCHEMBL2624012

SCHEMBL2624012

CN1C(C)(C)CC(OC=O)CC1(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13557779 0.81
SCHEMBL14409840 0.81 GAA (0.39)
SCHEMBL28798482 0.80
SCHEMBL14409839 0.79
SCHEMBL6685007 0.78
SCHEMBL12723551 0.78
SCHEMBL18087360 0.78
SCHEMBL11621420 0.77
SCHEMBL14394447 0.76 ESR1 (0.32)
SCHEMBL14165377 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 152 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3260492-B1 METHOD FOR PRODUCING RESIN ADDITIVE COMPOSITION AND RESIN ADDITIVE COMPOSITION ADEKA CORP (JP) 2021-01-13 EP disclosed
WO-2021002205-A1 LIQUID CRYSTAL COMPOSITION AND LIQUID CRYSTAL DISPLAY ELEMENT DIC株式会社 2021-01-07 WO disclosed
EP-3260492-A1 METHOD FOR PRODUCING RESIN ADDITIVE COMPOSITION AND RESIN ADDITIVE COMPOSITION Adeka Corporation (JP) 2017-12-27 EP disclosed
US-20170362506-A1 LIQUID-CRYSTALLINE MEDIUM MERCK PATENT GMBH (DE) 2017-12-21 US disclosed
US-9771489-B2 Ultraviolet ray curable ink composition for use in ink jet method and printed object SEIKO EPSON CORPORATION (JP) 2017-09-26 US disclosed
US-9732204-B2 Ultraviolet ray curable ink composition for use in ink jet method and printed object SEIKO EPSON CORPORATION (JP) 2017-08-15 US disclosed
US-9725611-B2 Ultraviolet ray curable ink composition for use in ink jet method and printed object SEIKO EPSON CORPORATION (JP) 2017-08-08 US disclosed
US-9688915-B2 Liquid crystal composition and liquid crystal display device JNC CORPORATION (JP) 2017-06-27 US disclosed
US-20170137653-A1 ULTRAVIOLET-CURABLE COMPOSITION AND RECORDED MATTER SEIKO EPSON CORPORATION (JP) 2017-05-18 US disclosed
US-20170137642-A1 ULTRAVIOLET-CURABLE COMPOSITION AND RECORDED MATTER SEIKO EPSON CORPORATION (JP) 2017-05-18 US disclosed
US-20080108540-A1 Antioxidants for the stabilization of formulations comprising surfactants HUEGLIN DIETMAR 2008-05-08 US disclosed
US-20080058459-A1 Porous Inorganic Materials Containing Polymer Additives CIBA CORP. 2008-03-06 US disclosed
US-20080009550-A1 Stabilized body care products, household products, textiles and fabrics LUPIA JOSEPH A 2008-01-10 US disclosed
US-20070294837-A1 Stabilized body care products, household products, textiles and fabrics LUPIA JOSEPH A 2007-12-27 US disclosed
US-7297365-B2 Recorded matter, method of producing recorded matter, method for improving image fastness, image fastness-improving agent, image fastness improving kit, dispenser, and applicator CANON KABUSHIKI KAISHA (JP) 2007-11-20 US disclosed
EP-1134087-B1 Image forming method and recorded matter using same SEIKO EPSON CORP (JP) 2007-07-25 EP disclosed
EP-1676887-B1 Composition and process for improving heat and weathering stability of segmented polyurethane polymers CIBA SC HOLDING AG (CH) 2007-05-23 EP disclosed
WO-2007048645-A2 PROTECTION OF OXIDIZABLE AGENTS CIBA HOLDING INC. (CH) 2007-05-03 WO disclosed
US-20070079446-A1 Stabilized body care products, household products, textiles and fabrics CIBA SPECIALTY CHEMICALS CORP. 2007-04-12 US disclosed
US-7179924-B2 Use of benzotriazole UV absorbers CIBA SPECIALTY CHEMICALS CORPORATION (US) 2007-02-20 US disclosed