Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 2/20 | 0.49 |
| ▸ | EPHX2 | P34913 | 4/20 | 0.48 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | HTT | P42858 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | NAAA | Q02083 | 1/20 | 0.40 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27436848 | 0.90 | CYP19A1 (0.53) | CYP19A1EPHX2CYP17A1TSHRNPSR1 | |
| SCHEMBL31416858 | 0.87 | CYP19A1 (0.40) | CYP19A1EPHX2CYP17A1TSHRNPSR1 | |
| SCHEMBL24361399 | 0.85 | CYP19A1 (0.50) | CYP19A1EPHX2CYP17A1TSHRNPSR1 | |
| SCHEMBL17407567 | 0.82 | CYP19A1 (0.47) | CYP19A1EPHX2CYP17A1TSHRNPSR1 | |
| SCHEMBL18923150 | 0.82 | EPHX2 (0.50) | CYP19A1EPHX2CYP17A1TSHRNPSR1 | |
| SCHEMBL18405541 | 0.82 | CYP19A1 (0.47) | CYP19A1EPHX2CYP17A1TSHRNPSR1 | |
| SCHEMBL22615613 | 0.82 | CYP19A1 (0.44) | CYP19A1EPHX2CYP17A1TSHRNPSR1 | |
| SCHEMBL2625639 | 0.80 | CYP19A1 (0.43) | CYP19A1EPHX2CYP17A1TSHRNPSR1 | |
| SCHEMBL15449243 | 0.79 | EPHX2 (0.55) | CYP19A1EPHX2CYP17A1TSHRNPSR1 | |
| SCHEMBL22186164 | 0.79 | CYP19A1 (0.45) | CYP19A1EPHX2CYP17A1TSHRNPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4554569-A1 | AGENT CONTAINING MALONIC ACID OR ITS DERIVATIVES FOR RESTORING METAL HOMEOSTASIS | Oxford Antibiotic Group GmbH (AT) | 2025-05-21 | — | — | EP | claimed |
| CN-119866217-A | Agent for restoring metal steady state containing malonic acid or derivative thereof | 牛津抗生素(制药)集团股份有限公司 | 2025-04-22 | — | — | CN | claimed |
| WO-2024013400-A1 | AGENT CONTAINING MALONIC ACID OR ITS DERIVATIVES FOR RESTORING METAL HOMEOSTASIS | OXFORD ANTIBIOTIC GROUP GMBH (AT) | 2024-01-18 | — | — | WO | claimed |
| EP-4554569-A1 | AGENT CONTAINING MALONIC ACID OR ITS DERIVATIVES FOR RESTORING METAL HOMEOSTASIS | Oxford Antibiotic Group GmbH (AT) | 2025-05-21 | — | — | EP | disclosed |
| CN-119866217-A | Agent for restoring metal steady state containing malonic acid or derivative thereof | 牛津抗生素(制药)集团股份有限公司 | 2025-04-22 | — | — | CN | disclosed |
| WO-2024013400-A1 | AGENT CONTAINING MALONIC ACID OR ITS DERIVATIVES FOR RESTORING METAL HOMEOSTASIS | OXFORD ANTIBIOTIC GROUP GMBH (AT) | 2024-01-18 | — | — | WO | disclosed |
| EP-4306107-A1 | METAL HOMEOSTASIS RESTORATION AGENT | Oxford Antibiotic Group GmbH (AT) | 2024-01-17 | — | — | EP | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| EP-3618833-B1 | TRIPARTITE ANDROGEN RECEPTOR ELIMINATORS, METHODS AND USES THEREOF | SPG THERAPEUTICS INC (US) | 2022-01-19 | — | — | EP | disclosed |
| EP-3782977-A1 | CYCLOPROPANATION METHOD AND REAGENT | Fundació Privada Institut Català d'Investigació Química (ICIQ) (ES) | 2021-02-24 | — | — | EP | disclosed |
| US-20130022916-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022920-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022919-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022925-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022915-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120156620-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120100483-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20120052443-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-01 | — | — | US | disclosed |
| CN-101253162-A | Adamantane derivative, resin composition containing same, and optical electronic component using same | IDEMITSU KOSAN CO (JP) | 2008-08-27 | — | — | CN | disclosed |