Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 2/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 4/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | CASP6 | P55212 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13222933 | 0.86 | POLB (0.48) | POLBKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL12630157 | 0.85 | KDM4E (0.44) | POLBKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL21236286 | 0.85 | KDM4E (0.49) | POLBKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL25470914 | 0.83 | POLB (0.48) | POLBKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL24225966 | 0.83 | KDM4E (0.48) | POLBKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL24861528 | 0.82 | KDM4E (0.47) | POLBKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL13779882 | 0.81 | POLB (0.51) | POLBKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL17717479 | 0.78 | POLB (0.54) | POLBKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL7746827 | 0.78 | POLB (0.56) | POLBKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL7746830 | 0.78 | POLB (0.56) | POLBKDM4EALDH1A1HPGDHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3382453-B1 | RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHINETSU CHEMICAL CO (JP) | 2023-09-20 | — | — | EP | disclosed |