SCHEMBL264151

SCHEMBL264151

[S-2].[Se-2].[Sn+4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1933980 0.87
Zinc Ion SCHEMBL8515032 0.87
SCHEMBL264517 0.82
SCHEMBL266064 0.82
Zinc Ion SCHEMBL142620 0.78
SCHEMBL17969540 0.78
Ammonia Solution, Strong SCHEMBL14661390 0.67
Potassium Ion SCHEMBL14660889 0.67
SCHEMBL9422060 0.67
SCHEMBL442013 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8803141-B2 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-08-12 US disclosed
US-8134150-B2 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-03-13 US disclosed
US-8053772-B2 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-11-08 US disclosed
US-20110240932-A1 HYDRAZINE-FREE SOLUTION DEPOSITION OF CHALCOGENIDE FILMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-10-06 US disclosed
US-7999255-B2 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-08-16 US disclosed
US-7960726-B2 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-06-14 US disclosed
US-20100040866-A1 HYDRAZINE-FREE SOLUTION DEPOSITION OF CHALCOGENIDE FILMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-02-18 US disclosed
US-20100040891-A1 HYDRAZINE-FREE SOLUTION DEPOSITION OF CHALCOGENIDE FILMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-02-18 US disclosed
US-20100041907-A1 HYDRAZINE-FREE SOLUTION DEPOSITION OF CHALCOGENIDE FILMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-02-18 US disclosed
US-20100019238-A1 HYDRAZINE-FREE SOLUTION DEPOSITION OF CHALCOGENIDE FILMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-01-28 US disclosed
US-7618841-B2 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-11-17 US disclosed
US-20070099331-A1 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-05-03 US disclosed
US-7094651-B2 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-08-22 US disclosed
US-6875661-B2 Solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2005-04-05 US disclosed
US-20050009225-A1 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION 2005-01-13 US disclosed
US-20050009229-A1 Solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION 2005-01-13 US disclosed