⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1470742 | 1.00 | — | — | |
| SCHEMBL5367093 | 0.98 | — | — | |
| SCHEMBL6890324 | 0.84 | — | — | |
| SCHEMBL9236608 | 0.84 | — | — | |
| SCHEMBL1469993 | 0.82 | — | — | |
| SCHEMBL1470715 | 0.82 | — | — | |
| SCHEMBL1322269 | 0.82 | — | — | |
| SCHEMBL206746 | 0.82 | — | — | |
| SCHEMBL4864205 | 0.82 | — | — | |
| SCHEMBL205691 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 251 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7615594-B2 | Graft copolymers and impact-resistant flame-retardant resin compositions containing the same | KANEKA CORPORATION (JP) | 2009-11-10 | — | — | US | claimed |
| US-20070202267-A1 | Sizing compositions for glass and polyolefin surfaces and methods of use | MARTIN EMIL | 2007-08-30 | — | — | US | claimed |
| EP-0821390-B1 | Conductive anti-reflection film, fabrication method thereof, and cathode ray tube therewith | TOSHIBA KK (JP) | 2003-03-12 | — | — | EP | claimed |
| US-5651921-A | Process for preparing a water repellent silica sol | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1997-07-29 | — | — | US | claimed |
| CN-115356873-B | Resin composition, light-shielding film, method for producing light-shielding film, and substrate with barrier ribs | 东丽株式会社 | 2025-04-25 | — | — | CN | disclosed |
| US-20240384065-A1 | SILOXANE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, AND METHOD OF PRODUCING POLYSILOXANE | TORAY INDUSTRIES, INC. (JP) | 2024-11-21 | — | — | US | disclosed |
| WO-2024185458-A1 | RESIN COMPOSITION, CURED FILM, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN OF CURED FILM, OPTICAL ELEMENT, AND METHOD FOR PRODUCING POLYSILOXANE | 東レ株式会社 | 2024-09-12 | — | — | WO | disclosed |
| EP-3410468-B1 | N-TYPE SEMICONDUCTOR ELEMENT, COMPLEMENTARY TYPE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND WIRELESS COMMUNICATION DEVICE IN WHICH THE SAME IS USED | TORAY INDUSTRIES (JP) | 2024-07-10 | — | — | EP | disclosed |
| US-11789363-B2 | Positive photosensitive resin composition, cured film therefrom, and solid state image sensor comprising the same | TORAY INDUSTRIES, INC. (JP) | 2023-10-17 | — | — | US | disclosed |
| EP-3382751-B1 | FERROELECTRIC MEMORY ELEMENT, METHOD FOR PRODUCING SAME, MEMORY CELL USING FERROELECTRIC MEMORY ELEMENT, AND RADIO COMMUNICATION DEVICE USING FERROELECTRIC MEMORY ELEMENT | TORAY INDUSTRIES (JP) | 2023-09-13 | — | — | EP | disclosed |
| CN-111771163-B | Negative photosensitive coloring composition, cured film, and touch panel using same | 东丽株式会社 | 2023-06-02 | — | — | CN | disclosed |
| CN-111095566-B | Field effect transistor, method of manufacturing the same, wireless communication device using the same, and merchandise tag | 东丽株式会社 | 2023-05-23 | — | — | CN | disclosed |
| EP-0821390-A1 | Conductive anti-reflection film, fabrication method thereof, and cathode ray tube therewith | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-01-28 | — | — | EP | disclosed |
| US-5651921-A | Process for preparing a water repellent silica sol | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1997-07-29 | — | — | US | disclosed |
| EP-0768352-A1 | MATERIAL FOR FORMING SILICA-BASE COATED INSULATION FILM, PROCESS FOR PRODUCING THE MATERIAL, SILICA-BASE INSULATION FILM, SEMICONDUCTOR DEVICE, AND PROCESS FOR PRODUCING THE DEVICE | HITACHI CHEMICAL CO., LTD. (JP) | 1997-04-16 | — | — | EP | disclosed |
| EP-0767467-A2 | Low dielectric resin composition | ASAHI GLASS COMPANY LTD. (JP) | 1997-04-09 | — | — | EP | disclosed |
| US-5612159-A | CERIUM OXIDE WITH FLUORINE | FUJI XEROX CO., LTD. (JP) | 1997-03-18 | — | — | US | disclosed |
| EP-0688806-A2 | Biodegradable aliphatic polyester, melt-extrusion film thereof, and process for the production thereof | TOKUYAMA CORPORATION (JP) | 1995-12-27 | — | — | EP | disclosed |
| EP-0475132-A1 | Water repellent silica sol and process for preparing the same | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-03-18 | — | — | EP | disclosed |
| US-4997738-A | Electrophotographic photoreceptor having silicate with perfluoroalkyl groups in protective layer | SHINDENGEN ELECTRIC MANUFACTURING CO., LTD. (JP) | 1991-03-05 | — | — | US | disclosed |