⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22344183 | 0.96 | — | — | |
| SCHEMBL373607 | 0.85 | — | — | |
| SCHEMBL13621365 | 0.85 | — | — | |
| SCHEMBL13484598 | 0.85 | — | — | |
| SCHEMBL140661 | 0.85 | — | — | |
| SCHEMBL12264073 | 0.84 | — | — | |
| SCHEMBL16087657 | 0.84 | — | — | |
| SCHEMBL25894092 | 0.84 | — | — | |
| SCHEMBL92417 | 0.84 | — | — | |
| SCHEMBL14198795 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 501 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025106343-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-05-22 | — | — | WO | claimed |
| US-20250157825-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-05-15 | — | — | US | claimed |
| CN-119038909-B | Low-density weather-resistant fireproof plate and preparation method thereof | 内蒙古猛骏建筑新材料科技有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-119038909-A | Low-density weather-resistant fireproof plate and preparation method thereof | 内蒙古猛骏建筑新材料科技有限公司 | 2024-11-29 | — | — | CN | claimed |
| US-20240258111-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-08-01 | — | — | US | claimed |
| CN-111056970-B | Method for removing residual methyl tributyroximo silane in butanone oxime hydrochloride | 浙江锦华新材料股份有限公司 | 2022-10-18 | — | — | CN | claimed |
| US-11447642-B2 | Methods of using surface treatment compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2022-09-20 | — | — | US | claimed |
| US-11174394-B2 | Surface treatment compositions and articles containing same | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-11-16 | — | — | US | claimed |
| CN-109776803-B | Preparation method for regulating and controlling molecular weight and distribution of poly (dimethylsiloxane-co-methylvinylsiloxane) | 中科院广州化学有限公司南雄材料生产基地 | 2021-07-23 | — | — | CN | claimed |
| US-20210122925-A1 | METHODS OF USING SURFACE TREATMENT COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2021-04-29 | — | — | US | claimed |
| US-6210856-B1 | Resist composition and process of forming a patterned resist layer on a substrate | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-04-03 | — | — | US | claimed |
| US-6103447-A | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2000-08-15 | — | — | US | claimed |
| EP-0632811-B1 | PRODUCTION OF TRIFLUOROVINYL ETHERS | DU PONT (US) | 1998-09-16 | — | — | EP | claimed |
| EP-0594175-B1 | Process for producing aromatic polycarbonate | MITSUBISHI CHEM CORP (JP) | 1997-06-18 | — | — | EP | claimed |
| US-5391796-A | Reacting acyl fluoride or anhydride with siloxane, thermolysis of resulting silyl ester to form trifluorovinyl ether and fluorosilane; for use as comonomers in perfluoro polymers | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-02-21 | — | — | US | claimed |
| US-5391691-A | Melt condensing am aromatic diol compound and a carbonic acid diester in the presence of an interesterification catalyst and co-presence of an organosilicon compound | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1995-02-21 | — | — | US | claimed |
| EP-0632811-A1 | PRODUCTION OF TRIFLUOROVINYL ETHERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-01-11 | — | — | EP | claimed |
| EP-0594175-A1 | Process for producing aromatic polycarbonate | MITSUBISHI CHEMICAL CORPORATION (JP) | 1994-04-27 | — | — | EP | claimed |
| US-5268511-A | Reacting a siloxane with a fluorinated acylhalide; heating in presence of a thermolysis catalyst | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-12-07 | — | — | US | claimed |
| WO-1993020085-A1 | PRODUCTION OF TRIFLUOROVINYL ETHERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-10-14 | — | — | WO | claimed |