Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL266312

[NH4+].[NH4+].[S-2].[S-2].[S-2].[Sn+4]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8803141-B2 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-08-12 US disclosed
US-20140179512-A1 PHOTOCATALYST FOR THE PRODUCTION OF HYDROGEN SUNPOWER TECHNOLOGIES LLC (US) 2014-06-26 US disclosed
WO-2014099855-A1 PHOTOCATALYST FOR THE PRODUCTION OF HYDROGEN SUNPOWER TECHNOLOGIES LLC (US) 2014-06-26 WO disclosed
US-8134150-B2 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-03-13 US disclosed
US-8053772-B2 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-11-08 US disclosed
US-20110240932-A1 HYDRAZINE-FREE SOLUTION DEPOSITION OF CHALCOGENIDE FILMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-10-06 US disclosed
US-7999255-B2 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-08-16 US disclosed
US-7960726-B2 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-06-14 US disclosed
US-20100040866-A1 HYDRAZINE-FREE SOLUTION DEPOSITION OF CHALCOGENIDE FILMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-02-18 US disclosed
US-20100040891-A1 HYDRAZINE-FREE SOLUTION DEPOSITION OF CHALCOGENIDE FILMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-02-18 US disclosed
US-20100041907-A1 HYDRAZINE-FREE SOLUTION DEPOSITION OF CHALCOGENIDE FILMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-02-18 US disclosed
US-20100019238-A1 HYDRAZINE-FREE SOLUTION DEPOSITION OF CHALCOGENIDE FILMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-01-28 US disclosed
US-7618841-B2 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-11-17 US disclosed
US-20070099331-A1 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-05-03 US disclosed
US-7094651-B2 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-08-22 US disclosed
US-6875661-B2 Solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2005-04-05 US disclosed
US-20050009225-A1 Hydrazine-free solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION 2005-01-13 US disclosed
US-20050009229-A1 Solution deposition of chalcogenide films INTERNATIONAL BUSINESS MACHINES CORPORATION 2005-01-13 US disclosed