SCHEMBL2674151

SCHEMBL2674151

O=C(OC1CCCC1)C(=CC1CCCC1)CCO

nearest known ligand 0.39

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 2/20 0.37
GRIK2 Q13002 1/20 0.37
NAAA Q02083 2/20 0.36
EPHX1 P07099 2/20 0.34
CYP2C19 P33261 1/20 0.33
HTT P42858 1/20 0.31
CYP19A1 P11511 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12098394 0.81 EPHX1 (0.42) GRIK1GRIK2NAAAEPHX1CYP2C19
SCHEMBL29108766 0.80 EPHX1 (0.45) GRIK1GRIK2NAAAEPHX1CYP2C19
SCHEMBL973679 0.80 GRIK1 (0.40) GRIK1GRIK2
SCHEMBL3853225 0.75 GRIK1 (0.56) GRIK1GRIK2
SCHEMBL352096 0.74 GRIK1 (0.33) GRIK1GRIK2EPHX1
SCHEMBL129313 0.73 EPHX1 (0.39) GRIK1GRIK2NAAAEPHX1CYP2C19
SCHEMBL6145484 0.72 EPHX1 (0.42) GRIK1NAAAEPHX1CYP2C19HTT
SCHEMBL809146 0.72 EPHX1 (0.42) GRIK1NAAAEPHX1CYP2C19HTT
SCHEMBL28962046 0.72 EPHX1 (0.42) GRIK1NAAAEPHX1CYP2C19HTT
SCHEMBL28041117 0.72 EPHX1 (0.42) GRIK1NAAAEPHX1CYP2C19HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103732689-A Photo-curable organic-inorganic hybrid resin composition DONGJIN SEMICHEM CO LTD 2014-04-16 CN disclosed
CN-101051186-B Negative photosensitive resin composition DONGJIN SEMICHEM CO LTD 2012-06-27 CN disclosed
US-8173729-B2 Photosensitive resin composition DONGJIN SEMICHEM CO., LTD. (KR) 2012-05-08 US disclosed
US-20100222473-A1 PHOTOSENSITIVE RESIN COMPOSITION DONGJIN SEMICHEM CO., LTD. (KR) 2010-09-02 US disclosed
CN-101051186-A Negative photosensitive resin composition DONGJIN SEMICHEM CO LTD (KR) 2007-10-10 CN disclosed