SCHEMBL2675357

SCHEMBL2675357

CCCCCCCCCCCCCCCCCOc1ccc(O)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
NR5A1 Q13285 1/20 1.00
LTA4H P09960 5/20 0.85
TP53 P04637 2/20 0.62
TSHR P16473 1/20 0.62
PLA2G4B P0C869 4/20 0.61
RARB P10826 3/20 0.57
NPC1 O15118 1/20 0.57
LMNA P02545 1/20 0.57
GAA P10253 1/20 0.57
MAPT P10636 1/20 0.57
ALOX15 P16050 1/20 0.57
RAB9A P51151 1/20 0.57
HSD17B10 Q99714 1/20 0.57
PLA2G4A P47712 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL337960 1.00 NR5A1 (1.00) NR5A1LTA4HTP53TSHRPLA2G4B
SCHEMBL1837360 1.00 NR5A1 (1.00) NR5A1LTA4HTP53TSHRPLA2G4B
SCHEMBL337505 1.00 NR5A1 (1.00) NR5A1LTA4HTP53TSHRPLA2G4B
SCHEMBL337790 1.00 NR5A1 (1.00) NR5A1LTA4HTP53TSHRPLA2G4B
SCHEMBL1834632 1.00 NR5A1 (1.00) NR5A1LTA4HTP53TSHRPLA2G4B
SCHEMBL1835315 1.00 NR5A1 (1.00) NR5A1LTA4HTP53TSHRPLA2G4B
SCHEMBL1401769 1.00 NR5A1 (1.00) NR5A1LTA4HTP53TSHRPLA2G4B
SCHEMBL4238973 1.00 NR5A1 (1.00) NR5A1LTA4HTP53TSHRPLA2G4B
SCHEMBL21054750 1.00 NR5A1 (1.00) NR5A1LTA4HTP53TSHRPLA2G4B
SCHEMBL57745 1.00 NR5A1 (1.00) NR5A1LTA4HTP53TSHRPLA2G4B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3908576-A1 A PROCESS FOR THE PREPARATION OF UV ABSORBERS BASF SE (DE) 2021-11-17 EP disclosed
EP-3908633-A1 A PROCESS FOR THE PREPARATION OF TRIAZINE INTERMEDIATES AND A PROCESS FOR THE PREPARATION OF UV ABSORBERS THEREOF BASF SE (DE) 2021-11-17 EP disclosed
CN-113260679-A Process for preparing triazine intermediates and process for preparing UV absorbers thereof 巴斯夫欧洲公司 2021-08-13 CN disclosed
CN-113260611-A Method for producing UV absorbers 巴斯夫欧洲公司 2021-08-13 CN disclosed
WO-2020144094-A1 A PROCESS FOR THE PREPARATION OF UV ABSORBERS BASF SE (DE) 2020-07-16 WO disclosed
WO-2020144093-A1 A PROCESS FOR THE PREPARATION OF TRIAZINE INTERMEDIATES AND A PROCESS FOR THE PREPARATION OF UV ABSORBERS THEREOF BASF SE (DE) 2020-07-16 WO disclosed
EP-2455798-B1 PROCESS FOR PRODUCTION OF POLYCARBONATE MATERIAL HAVING EXCELLENT SOLUBILITY AND AFFINITY, AND MATERIAL FOR CONTACT LENS COMPRISING THE SAME MENICON CO LTD (JP) 2015-07-08 EP disclosed
US-8710157-B2 Contact lens material MENICON CO., LTD. (JP) 2014-04-29 US disclosed
EP-2455797-B1 MATERIAL FOR CONTACT LENS MENICON CO LTD (JP) 2013-12-25 EP disclosed
US-8501878-B2 Method for producing polycarbonate material having excellent solubility and affinity, and contact lens material comprising the same MENICON CO., LTD. (JP) 2013-08-06 US disclosed
EP-1138714-B1 Polycarbonate resin and optical article used the same MITSUBISHI GAS CHEMICAL CO (JP) 2005-02-23 EP disclosed
US-6630562-B2 Radiation and wear resistant molding materials; weatherproofing; mixture with polysiloxane MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-10-07 US disclosed
US-20020132959-A1 Polycarbonate resin MITSUBISHI GAS CHEMICAL COMPANY, INC. 2002-09-19 US disclosed
EP-1223184-A1 Polycarbonate resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2002-07-17 EP disclosed
US-6340737-B2 COPOLYCARBONATE OF A 9,9-BIS(HYDROXYPHENYL)FLUORENE COMPOUND, A POLYSILOXANE ENDCAPPED WITH A HYDROXYPHENYL GROUP, AND A PHENOLIC DIOL SUCH AS BISPHENOL A; REDUCED OBLIQUE INCIDENCE BIREFRINGENCE, MOLDABILITY, GOOD TRANSPARENCY MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2002-01-22 US disclosed
US-20010039313-A1 Polycarbonate resin and optical article used the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-11-08 US disclosed
EP-1138714-A2 Polycarbonate resin and optical article used the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-10-04 EP disclosed
US-5422038-A Ferroelectric liquid crystal material with sufficient spontaneous polarization, high speed response capability, wide temperature range SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1995-06-06 US disclosed
EP-0416946-B1 Optically active naphthalene derivative, process for preparation thereof, liquid crystal composition containing the same as effective component, and liquid crystal element using the same SUMITOMO CHEMICAL CO (JP) 1994-11-09 EP disclosed
EP-0416946-A2 Optically active naphthalene derivative, process for preparation thereof, liquid crystal composition containing the same as effective component, and liquid crystal element using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1991-03-13 EP disclosed