SCHEMBL26807619

SCHEMBL26807619

CN1C(C)(C)CC(OC(=O)c2ccc(OC(=O)c3cc(I)cc(I)c3I)c3ccccc23)CC1(C)C

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 2/20 0.35
▸ HTR3E A5X5Y0 9/20 0.33
▸ HTR3B O95264 9/20 0.33
▸ HTR3A P46098 9/20 0.33
▸ HTR3D Q70Z44 9/20 0.33
▸ HTR3C Q8WXA8 9/20 0.33
▸ HTT P42858 2/20 0.33
▸ CHRNA1 P02708 1/20 0.33
▸ CHRNG P07510 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ HTR1A P08908 1/20 0.33
▸ CHRM5 P08912 1/20 0.33
▸ CYP2D6 P10635 1/20 0.33
▸ MAPT P10636 1/20 0.33
▸ CHRM1 P11229 1/20 0.33
▸ CHRNB1 P11230 1/20 0.33
▸ CHRNB2 P17787 1/20 0.33
▸ ADRA2B P18089 1/20 0.33
▸ ADRA2C P18825 1/20 0.33
▸ CHRM3 P20309 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26807893 0.92 TSHR (0.34) TSHRHTR3EHTR3BHTR3AHTR3D
SCHEMBL26427858 0.85 TSHR (0.37) TSHRHTR3EHTR3BHTR3AHTR3D
SCHEMBL26812150 0.84 GAA (0.40) TSHRHTR3EHTR3BHTR3AHTR3D
SCHEMBL26807617 0.79 TSHR (0.40) TSHRHTR3EHTR3BHTR3AHTR3D
SCHEMBL26807630 0.76 TSHR (0.32) TSHRHTTGAA
SCHEMBL26807659 0.76 TSHR (0.33) TSHRHTTKMT2AGAA
SCHEMBL26807658 0.76 TSHR (0.33) TSHRHTTKMT2AGAA
SCHEMBL26810080 0.76 GAA (0.47) TSHRHTTCYP3A4LMNAKMT2A
SCHEMBL26807585 0.75 TSHR (0.36) TSHRHTR3EHTR3BHTR3AHTR3D
SCHEMBL26426670 0.73 IDO1 (0.40) TSHRHTTMAPTSMN1; SMN2KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
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