SCHEMBL26807635

SCHEMBL26807635

CN1C(C)(C)CC(OC(=O)C2CC3CC2CC3OC(=O)c2cc(I)cc(I)c2I)CC1(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26807889 0.91 — —
SCHEMBL26807910 0.85 — —
SCHEMBL26427858 0.84 TSHR (0.37) —
SCHEMBL26807640 0.81 — —
SCHEMBL26807630 0.80 TSHR (0.32) —
SCHEMBL19678504 0.79 — —
SCHEMBL26807658 0.75 TSHR (0.33) —
SCHEMBL26807659 0.75 TSHR (0.33) —
SCHEMBL26807607 0.75 TSHR (0.31) —
SCHEMBL26810080 0.75 GAA (0.47) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
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