Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.49 |
| ▸ | POLB | P06746 | 1/20 | 0.49 |
| ▸ | GAA | P10253 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.49 |
| ▸ | JAK2 | O60674 | 2/20 | 0.37 |
| ▸ | JAK1 | P23458 | 2/20 | 0.37 |
| ▸ | TYK2 | P29597 | 2/20 | 0.37 |
| ▸ | JAK3 | P52333 | 2/20 | 0.37 |
| ▸ | SLC6A3 | Q01959 | 8/20 | 0.34 |
| ▸ | SLC6A4 | P31645 | 6/20 | 0.34 |
| ▸ | BRD4 | O60885 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21580256 | 0.78 | MEN1 (0.43) | MEN1POLBGAAKMT2AJAK2 | |
| SCHEMBL27199182 | 0.77 | MEN1 (0.61) | MEN1POLBGAAKMT2AJAK2 | |
| SCHEMBL25693819 | 0.77 | MEN1 (0.45) | MEN1POLBGAAKMT2AJAK2 | |
| SCHEMBL17323519 | 0.76 | MEN1 (0.47) | MEN1POLBGAAKMT2AJAK2 | |
| SCHEMBL2758394 | 0.75 | MEN1 (0.46) | MEN1POLBGAAKMT2AJAK2 | |
| SCHEMBL22417464 | 0.74 | MEN1 (0.32) | MEN1POLBGAAKMT2AJAK2 | |
| SCHEMBL23040796 | 0.73 | MEN1 (0.61) | MEN1POLBGAAKMT2AJAK2 | |
| SCHEMBL24564603 | 0.72 | MEN1 (0.41) | MEN1POLBGAAKMT2AJAK2 | |
| SCHEMBL25694033 | 0.72 | MEN1 (0.30) | MEN1POLBGAAKMT2A | |
| SCHEMBL3969544 | 0.72 | MEN1 (0.47) | MEN1POLBGAAKMT2AJAK2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4279991-A1 | NOVEL SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-22 | — | — | EP | disclosed |
| EP-4276533-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-11-15 | — | — | EP | disclosed |