SCHEMBL268448

SCHEMBL268448

C=CC(=O)OCC1CC2CC1C1C(COC(=O)C=C)CCC21

nearest known ligand 0.33

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.33
ALDH1A1 P00352 4/20 0.33
TP53 P04637 3/20 0.33
HIF1A Q16665 3/20 0.33
CYP3A4 P08684 2/20 0.33
HSD17B10 Q99714 1/20 0.33
MAPK1 P28482 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
HPGD P15428 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22902679 0.92 TSHR (0.35) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL336819 0.90 TSHR (0.33) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL13752060 0.88
SCHEMBL26398013 0.87 TSHR (0.39) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL24530128 0.84 TSHR (0.38) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL18634260 0.84 TSHR (0.38) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL24288116 0.84 CHRM1 (0.31) TSHR
SCHEMBL15356238 0.84 TSHR (0.33) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL4059135 0.83 TSHR (0.34) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL15356230 0.83 TSHR (0.30) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10781341-B2 Polyimide compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2020-09-22 US disclosed
EP-1958981-B1 BARRIER LAMINATE, BARRIER FILM SUBSTRATE, METHODS FOR PRODUCING THEM, AND DEVICE FUJIFILM CORP (JP) 2018-04-25 EP disclosed
US-20150219990-A1 Novel Polyimide Compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-08-06 US disclosed
US-20150219990-A1 Novel Polyimide Compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-08-06 US disclosed
US-8980374-B2 Method for producing functional film FUJIFILM CORPORATION (JP) 2015-03-17 US disclosed
US-8637147-B2 Barrier laminate, gas barrier film and device using the same FUJIFILM CORPORATION (JP) 2014-01-28 US disclosed
US-8637147-B2 Barrier laminate, gas barrier film and device using the same FUJIFILM CORPORATION (JP) 2014-01-28 US disclosed
US-8236912-B2 Gas-barrier film and environment-sensitive device FUJIFILM CORPORATION (JP) 2012-08-07 US disclosed
US-8197946-B2 Barrier laminate, barrier film substrate, methods for producing them, and device FUJIFILM CORPORATION (JP) 2012-06-12 US disclosed
US-8197946-B2 Barrier laminate, barrier film substrate, methods for producing them, and device FUJIFILM CORPORATION (JP) 2012-06-12 US disclosed
US-20090280249-A1 PROCESS AND APPARATUS FOR FLASH EVAPORATION FUJIFILM CORPORATION (JP) 2009-11-12 US disclosed
US-20090280249-A1 PROCESS AND APPARATUS FOR FLASH EVAPORATION FUJIFILM CORPORATION (JP) 2009-11-12 US disclosed
US-20090239089-A1 BARRIER LAMINATE AND METHOD FOR PRODUCING SAME, BARRIER FILM SUBSTRATE, DEVICE AND OPTICAL COMPONENT FUJIFILM CORPORATION (JP) 2009-09-24 US disclosed
EP-2103646-A1 Barrier laminate and method for producing same, barrier film substrate, device and optical component Fujifilm Corporation (JP) 2009-09-23 EP disclosed
US-20090196997-A1 METHOD FOR PRODUCING FUNCTIONAL FILM FUJIFILM CORPORATION (JP) 2009-08-06 US disclosed
US-20090095345-A1 GAS-BARRIER FILM AND ENVIRONMENT-SENSITIVE DEVICE FUJIFILM CORPORATION (JP) 2009-04-16 US disclosed
US-20090075098-A1 ENVIRONMENT-SENSITIVE DEVICE, AND METHOD FOR SEALING ENVIRONMENT- SENSITIVE ELEMENT FUJIFILM CORPORATION (JP) 2009-03-19 US disclosed
US-20090029183-A1 BARRIER FILM SUBSTRATE AND METHOD FOR PRODUCING SAME, AND ORGANIC DEVICE FUJIFILM CORPORATION (JP) 2009-01-29 US disclosed
US-20080305350-A1 BARRIER LAMINATE, BARRIER FILM SUBSTRATE, METHODS FOR PRODUCING THEM, AND DEVICE FUJIFILM CORPORATION (JP) 2008-12-11 US disclosed
EP-1958981-A2 Barriere laminate, barrier film substrate, methods for producing them, and device FUJIFILM Corporation (JP) 2008-08-20 EP disclosed