SCHEMBL2688367

SCHEMBL2688367

CCCC(F)(F)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5170725 0.75
SCHEMBL7859444 0.73
SCHEMBL11959481 0.73
SCHEMBL7966111 0.73
SCHEMBL9968803 0.73
SCHEMBL9968793 0.71
SCHEMBL7751985 0.71
SCHEMBL12249897 0.71
SCHEMBL12903605 0.71
SCHEMBL5979095 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8936744-B2 Photocurable resin composition containing fluorine and method for producing a resin mold using same DONGJIN SEMICHEM CO., LTD. (KR) 2015-01-20 US claimed
US-20120114906-A1 PHOTOCURABLE RESIN COMPOSITION CONTAINING FLUORINE AND METHOD FOR PRODUCING A RESIN MOLD USING SAME DONGJIN SEMICHEM CO., LTD (KR) 2012-05-10 US claimed
US-20250297145-A1 SURFACE TOLERANT ADHESIVE HUNTSMAN ADVANCED MATERIALS AMERICAS LLC 2025-09-25 US disclosed
WO-2023183119-A9 SURFACE TOLERANT ADHESIVE HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2023-11-16 WO disclosed
WO-2023183119-A2 SURFACE TOLERANT ADHESIVE HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2023-09-28 WO disclosed
US-9518222-B2 Liquid crystal compound, liquid crystal composition and liquid crystal display device JNC CORPORATION (JP) 2016-12-13 US disclosed
US-9441161-B2 Liquid crystal compound, liquid crystal composition and liquid crystal display device JNC CORPORATION (JP) 2016-09-13 US disclosed
US-9273245-B2 Compound having 2,2-difluorovinyloxy group or 1,2,2-trifluorovinyloxy group, liquid crystal composition and liquid crystal display device JNC CORPORATION (JP) 2016-03-01 US disclosed
US-20160046864-A1 LIQUID CRYSTAL COMPOUND, LIQUID CRYSTAL COMPOSITION AND LIQUID CRYSTAL DISPLAY DEVICE JNC PETROCHEMICAL CORPORATION (JP) 2016-02-18 US disclosed
US-20160032187-A1 LIQUID CRYSTAL COMPOUND, LIQUID CRYSTAL COMPOSITION AND LIQUID CRYSTAL DISPLAY DEVICE JNC PETROCHEMICAL CORPORATION (JP) 2016-02-04 US disclosed
US-8936744-B2 Photocurable resin composition containing fluorine and method for producing a resin mold using same DONGJIN SEMICHEM CO., LTD. (KR) 2015-01-20 US disclosed
US-20120114906-A1 PHOTOCURABLE RESIN COMPOSITION CONTAINING FLUORINE AND METHOD FOR PRODUCING A RESIN MOLD USING SAME DONGJIN SEMICHEM CO., LTD (KR) 2012-05-10 US disclosed
US-7838087-B2 Benzene derivative, liquid crystal composition and liquid crystal display device CHISSO CORPORATION (JP) 2010-11-23 US disclosed
US-7794802-B2 Polymerizable liquid crystal compound, composition and polymer CHISSO CORPORATION (JP) 2010-09-14 US disclosed
US-20100144993-A1 CURABLE FLUORINE-CONTAINING POLYMER, CURABLE RESIN COMPOSITION PREPARED FROM SAME AND ANTIREFLECTION FILM DAIKIN INDUSTRIES, LTD. (JP) 2010-06-10 US disclosed
US-20100076171-A1 Polymerizable liquid crystal compound, composition and polymer CHISSO CORPORATION 2010-03-25 US disclosed
US-7429411-B2 Chroman compound, liquid crystal composition including the compound and liquid crystal display element including the liquid crystal composition CHISSO PETROCHEMICAL CORPORATION (JP) 2008-09-30 US disclosed
US-7429411-B2 Chroman compound, liquid crystal composition including the compound and liquid crystal display element including the liquid crystal composition CHISSO PETROCHEMICAL CORPORATION (JP) 2008-09-30 US disclosed
US-7413782-B2 Polymerizing binaphthalene derivatives CHISSO CORPORATION (JP) 2008-08-19 US disclosed
US-20070200092-A1 Benzene Derivative, Liquid Crystal Composition And Liquid Crystal Display Device JNC PETROCHEMICAL CORPORATION (JP) 2007-08-30 US disclosed