⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6285881 | 0.80 | — | — | |
| SCHEMBL2418897 | 0.80 | — | — | |
| SCHEMBL18428667 | 0.68 | — | — | |
| SCHEMBL22026612 | 0.68 | — | — | |
| SCHEMBL3909174 | 0.68 | — | — | |
| SCHEMBL6359958 | 0.68 | — | — | |
| Hydrochloric Acid SCHEMBL27437629 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL3687074 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL27437630 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL3687072 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12509768-B2 | Method of manufacturing semiconductor device, substrate processing apparatus and evaporation system | Kokusai Electric Corporation (JP) | 2025-12-30 | — | — | US | disclosed |
| US-20220042170-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND EVAPORATION SYSTEM | Kokusai Electric Corporation (JP) | 2022-02-10 | — | — | US | disclosed |
| US-10767260-B2 | Substrate processing apparatus, vaporization system and mist filter | Kokusai Electric Corporation (JP) | 2020-09-08 | — | — | US | disclosed |
| US-10392700-B2 | Solid vaporizer | ENTEGRIS, INC. (US) | 2019-08-27 | — | — | US | disclosed |
| US-20190032206-A1 | Modular Tray Ampoule | TRUIST BANK, AS NOTES COLLATERAL AGENT | 2019-01-31 | — | — | US | disclosed |
| US-20180274093-A1 | SUBSTRATE PROCESSING APPARATUS, VAPORIZATION SYSTEM AND MIST FILTER | HITACHI KOKUSAI ELECTRIC INC. (JP) | 2018-09-27 | — | — | US | disclosed |
| US-20170342557-A1 | SOLID VAPORIZER | TRUIST BANK, AS NOTES COLLATERAL AGENT | 2017-11-30 | — | — | US | disclosed |
| WO-2015164029-A1 | SOLID VAPORIZER | ENTEGRIS, INC. (US) | 2015-10-29 | — | — | WO | disclosed |
| US-20130267100-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND EVAPORATION SYSTEM | HITACHI KOKUSAI ELECTRIC INC. (JP) | 2013-10-10 | — | — | US | disclosed |
| US-8168547-B2 | Manufacturing method of semiconductor device | RENESAS ELECTRONICS CORPORATION (JP) | 2012-05-01 | — | — | US | disclosed |
| US-20100187644-A1 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | RENESAS TECHNOLOGY CORP | 2010-07-29 | — | — | US | disclosed |
| US-20090011608-A1 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | RENESAS TECHNOLOGY CORP. | 2009-01-08 | — | — | US | disclosed |
| US-20080283929-A1 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME | RENESAS TECHNOLOGY CORP. | 2008-11-20 | — | — | US | disclosed |