SCHEMBL26908445

SCHEMBL26908445

O=P(O)(O)CCCCCCCCCCCCc1ccccc1

nearest known ligand 0.75

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
S1PR2 O95136 6/20 0.75
S1PR1 P21453 6/20 0.75
S1PR3 Q99500 6/20 0.75
S1PR4 O95977 5/20 0.75
TSHR P16473 1/20 0.63
CETP P11597 1/20 0.57
SIGMAR1 Q99720 1/20 0.55
MAPT P10636 1/20 0.55
RXFP1 Q9HBX9 1/20 0.55
L3MBTL1 Q9Y468 1/20 0.52
HDAC1 Q13547 1/20 0.51
FDPS P14324 2/20 0.51
ANPEP P15144 1/20 0.50
ERAP1 Q9NZ08 1/20 0.50
S1PR5 Q9H228 1/20 0.50
LPAR2 Q9HBW0 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26908449 1.00 S1PR2 (0.75) S1PR2S1PR1S1PR3S1PR4TSHR
SCHEMBL26908443 1.00 S1PR2 (0.75) S1PR2S1PR1S1PR3S1PR4TSHR
SCHEMBL3208019 1.00 S1PR2 (0.75) S1PR2S1PR1S1PR3S1PR4TSHR
SCHEMBL8949998 1.00 S1PR2 (0.75) S1PR2S1PR1S1PR3S1PR4TSHR
SCHEMBL26908451 1.00 S1PR2 (0.75) S1PR2S1PR1S1PR3S1PR4TSHR
SCHEMBL2399825 1.00 S1PR2 (0.75) S1PR2S1PR1S1PR3S1PR4TSHR
SCHEMBL4414066 0.98 S1PR2 (0.72) S1PR2S1PR1S1PR3S1PR4TSHR
Hydrochloric Acid SCHEMBL8729222 0.96 S1PR2 (0.70) S1PR2S1PR1S1PR3S1PR4TSHR
SCHEMBL4406117 0.92 S1PR2 (0.69) S1PR2S1PR1S1PR3S1PR4TSHR
SCHEMBL9414561 0.87 S1PR2 (0.59) S1PR2S1PR1S1PR3S1PR4TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240116075-A1 SUBSTRATE, SELECTIVE FILM DEPOSITION METHOD, DEPOSITION FILM OF ORGANIC MATTER, AND ORGANIC MATTER CENTRAL GLASS COMPANY, LIMITED (JP) 2024-04-11 US disclosed
EP-4287240-A1 SUBSTRATE, SELECTIVE FILM DEPOSITION METHOD, DEPOSITION FILM OF ORGANIC MATTER, AND ORGANIC MATTER Central Glass Company, Limited (JP) 2023-12-06 EP disclosed
CN-116685715-A Substrate, selective film deposition method, deposited film of organic substance, and organic substance 中央硝子株式会社 2023-09-01 CN disclosed
WO-2022163825-A1 SUBSTRATE, SELECTIVE FILM DEPOSITION METHOD, DEPOSITION FILM OF ORGANIC MATTER, AND ORGANIC MATTER セントラル硝子株式会社 2022-08-04 WO disclosed