SCHEMBL26928883

SCHEMBL26928883

CC(=Cc1ccc(C)cc1)C[O]

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 1/20 0.44
PTGS2 P35354 2/20 0.41
RAB9A P51151 3/20 0.40
MAPT P10636 2/20 0.40
NPC1 O15118 2/20 0.40
POLB P06746 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.38
KMT2A Q03164 1/20 0.38
CA1 P00915 1/20 0.38
GAA P10253 1/20 0.38
AKR1C3 P42330 1/20 0.37
ALDH1A1 P00352 2/20 0.36
KDM4E B2RXH2 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
FOS P01100 1/20 0.36
JUN P05412 1/20 0.36
TRPM8 Q7Z2W7 1/20 0.36
PKM P14618 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1758882 0.80 CYP2A6 (0.41) CYP2A6PTGS2RAB9AMAPTNPC1
SCHEMBL1758330 0.80 CYP2A6 (0.41) CYP2A6PTGS2RAB9AMAPTNPC1
SCHEMBL17969091 0.80 TSHR (0.54) SMN1; SMN2KMT2AAKR1C3ALDH1A1KDM4E
SCHEMBL1758165 0.80 CYP2A6 (0.41) CYP2A6PTGS2RAB9AMAPTNPC1
SCHEMBL3470164 0.80 TSHR (0.54) SMN1; SMN2KMT2AAKR1C3ALDH1A1KDM4E
SCHEMBL6247478 0.80 CYP2A6 (0.41) CYP2A6PTGS2RAB9AMAPTNPC1
SCHEMBL1758883 0.80 CYP2A6 (0.41) CYP2A6PTGS2RAB9AMAPTNPC1
SCHEMBL4697789 0.78 CYP2A6 (0.39) CYP2A6PTGS2RAB9AMAPTNPC1
SCHEMBL3595056 0.78 GSK3B (0.42) CYP2A6PTGS2RAB9AMAPTNPC1
SCHEMBL11048028 0.78 CYP2A6 (0.39) CYP2A6PTGS2RAB9AMAPTNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023238836-A1 SILSESQUIOXANE DERIVATIVE AND METHOD FOR PRODUCING SAME, CURABLE COMPOSITION, HARD COAT AGENT, CURED PRODUCT, HARD COAT, AND BASE MATERIAL 東亞合成株式会社 2023-12-14 WO disclosed