⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL2431126 | 0.82 | — | — | |
| SCHEMBL1680064 | 0.82 | — | — | |
| Water SCHEMBL28125038 | 0.82 | — | — | |
| Water SCHEMBL11467006 | 0.82 | — | — | |
| SCHEMBL21751273 | 0.82 | — | — | |
| SCHEMBL28699475 | 0.82 | — | — | |
| SCHEMBL8322634 | 0.71 | — | — | |
| SCHEMBL7027 | 0.71 | — | — | |
| SCHEMBL906520 | 0.71 | — | — | |
| SCHEMBL7945219 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4434101-A1 | TUNING OF FORMULATIONS BASED ON ANION-CONDUCTIVE POLYMERS (IONOMERS) FOR PRODUCING ELECTROCHEMICALLY ACTIVE LAYERS | Evonik Operations GmbH (DE) | 2024-09-25 | — | — | EP | claimed |
| WO-2023088714-A1 | TUNING OF FORMULATIONS BASED ON ANION-CONDUCTIVE POLYMERS (IONOMERS) FOR PRODUCING ELECTROCHEMICALLY ACTIVE LAYERS | EVONIK OPERATIONS GMBH (DE) | 2023-05-25 | — | — | WO | claimed |
| EP-4181240-A1 | COORDINATION OF FORMULATIONS BASED ON ANION CONDUCTIVE POLYMERS (IONOMERS) FOR THE PREPARATION OF ELECTROCHEMICALLY ACTIVE LAYERS | Evonik Operations GmbH (DE) | 2023-05-17 | — | — | EP | claimed |
| US-8288240-B2 | Method of making an MIM capacitor and MIM capacitor structure formed thereby | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-10-16 | — | — | US | claimed |
| US-20100207246-A1 | METHOD OF MAKING AN MIM CAPACITOR AND MIM CAPACITOR STRUCTURE FORMED THEREBY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-08-19 | — | — | US | claimed |
| EP-0361484-B1 | PROCESS FOR PREPARATION OF ALLYL ACETATE | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1993-06-16 | — | — | EP | claimed |
| US-5011980-A | Reacting propylene, acetic acid and oxygen in presence of catalyst | SHOWA DENKO K.K. (JP) | 1991-04-30 | — | — | US | claimed |
| EP-0361484-A2 | Process for preparation of allyl acetate | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1990-04-04 | — | — | EP | claimed |
| JP-10335107-A | — | — | None | — | — | JP | disclosed |
| JP-10335107-A | — | — | None | — | — | JP | disclosed |
| EP-4743417-A1 | ROBUST ELECTROCATALYTIC REACTOR FOR THE REMEDIATION OF WASTEWATER | RH-Imaging Systems Inc. (CA) | 2026-05-20 | — | — | EP | disclosed |
| CN-115403631-B | Antitumor compound and preparation method and application thereof | 中国计量大学 | 2025-04-11 | — | — | CN | disclosed |
| US-20250019272-A1 | ROBUST ELECTROCATALYTIC REACTOR FOR THE REMEDIATION OF WASTEWATER | HERRING RODNEY (CA) | 2025-01-16 | — | — | US | disclosed |
| WO-2025010505-A1 | ROBUST ELECTROCATALYTIC REACTOR FOR THE REMEDIATION OF WASTEWATER | RH-IMAGING SYSTEMS INC. (CA) | 2025-01-16 | — | — | WO | disclosed |
| CN-1825504-A | Thick film resistor, manufacturing method thereof, glass composition for thick film resistor and thick film resistor paste | TDK CORP (JP) | 2006-08-30 | — | — | CN | disclosed |
| US-20060186382-A1 | Thick film resistor, manufacturing method thereof, glass composition for thick film resistor and thick film resistor paste | TDK CORPORATION (JP) | 2006-08-24 | — | — | US | disclosed |
| EP-1693858-A1 | Thick film resistor, manufacturing method thereof, glass composition for thick film resistor and thick film resistor paste | TDK Corporation (JP) | 2006-08-23 | — | — | EP | disclosed |
| US-6706421-B1 | LAYER OF NICKEL-CHROMIUM ALLOY, LAYER OF RUTHENIUM OR RHODIUM, SECOND NICKEL-CHROMIUM ALLOY; SUPERIOR ELECTRICAL AND MECHANICAL PROPERTIES | HEADWAY TECHNOLOGIES, INC. | 2004-03-16 | — | — | US | disclosed |
| JP-H10335107-A | MANUFACTURE OF LEAD RUTHENIUM MICRO-POWER AND RESISTOR PASTE USING THE SAME | TANAKA KIKINZOKU KOGYO KK | 1998-12-18 | — | — | JP | disclosed |
| JP-H10335107-A | MANUFACTURE OF LEAD RUTHENIUM MICRO-POWER AND RESISTOR PASTE USING THE SAME | TANAKA KIKINZOKU KOGYO KK | 1998-12-18 | — | — | JP | disclosed |