SCHEMBL26973184

SCHEMBL26973184

CS(=O)(=O)NCCOC(=O)C1C2CC3C(OC(=O)C31)C2OC(=O)c1cc(I)cc(I)c1I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24054836 0.90 — —
SCHEMBL19756184 0.87 — —
SCHEMBL26068003 0.85 — —
SCHEMBL22097482 0.84 NPC1 (0.31) —
SCHEMBL24268499 0.82 — —
SCHEMBL24268515 0.81 — —
SCHEMBL19756181 0.80 — —
SCHEMBL19678512 0.80 — —
SCHEMBL26059447 0.77 — —
SCHEMBL19756034 0.76 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11860540-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-02 — — US disclosed
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