SCHEMBL26973445

SCHEMBL26973445

BCc1cc(CB)c(CB)c(C(=O)CC2CC(OC(=O)c3cc(CB)cc(CB)c3CB)CC(C(=O)OCCS(=O)(=O)O)C2)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25528212 0.91 — —
SCHEMBL25476391 0.84 — —
SCHEMBL25476379 0.84 — —
SCHEMBL25476350 0.84 — —
SCHEMBL25476390 0.82 — —
SCHEMBL25476360 0.76 — —
SCHEMBL25737069 0.76 — —
SCHEMBL25476380 0.74 — —
SCHEMBL25476352 0.74 — —
SCHEMBL25476175 0.72 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11860540-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-02 — — US disclosed
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