SCHEMBL2701949

SCHEMBL2701949

CCCCCC=CCC=CCCCCCCCC(=O)N(CCO)CCO

nearest known ligand 0.91

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CNR1 P21554 4/20 0.69
TRPV1 Q8NER1 2/20 0.69
CNR2 P34972 1/20 0.69
ALDH1A1 P00352 6/20 0.59
KDM4E B2RXH2 3/20 0.59
F7 P08709 3/20 0.59
F3 P13726 3/20 0.59
HPGD P15428 3/20 0.59
PPARG P37231 2/20 0.59
PPARD Q03181 2/20 0.59
PPARA Q07869 2/20 0.59
FABP3 P05413 2/20 0.59
TDP1 Q9NUW8 2/20 0.59
FFAR1 O14842 2/20 0.59
DUSP3 P51452 1/20 0.59
PTPN7 P35236 1/20 0.59
LMNA P02545 1/20 0.59
CYP3A4 P08684 1/20 0.59
CYP19A1 P11511 1/20 0.59
FABP4 P15090 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3724145 1.00 CNR1 (0.69) CNR1TRPV1CNR2ALDH1A1KDM4E
SCHEMBL338570 1.00 CNR1 (0.69) CNR1TRPV1CNR2ALDH1A1KDM4E
SCHEMBL2712335 0.95 CNR1 (0.76) CNR1TRPV1CNR2ALDH1A1KDM4E
SCHEMBL874378 0.95 CNR1 (0.61) CNR1TRPV1CNR2F7F3
SCHEMBL10613227 0.95 CNR1 (0.61) CNR1TRPV1CNR2F7F3
SCHEMBL10457976 0.95 CNR1 (0.61) CNR1TRPV1CNR2F7F3
SCHEMBL1614760 0.95 CNR1 (0.61) CNR1TRPV1CNR2F7F3
SCHEMBL10432515 0.95 CNR1 (0.61) CNR1TRPV1CNR2F7F3
SCHEMBL757458 0.95 CNR1 (0.61) CNR1TRPV1CNR2F7F3
SCHEMBL8115798 0.94 CNR1 (0.60) CNR1TRPV1CNR2F7F3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115961914-B One-dose multifunctional online blocking removal process suitable for thin-difference reservoir 大庆井升伟业油田技术服务有限公司 2023-08-29 CN claimed
CN-115961914-A One-dose-multipotent online plug removal process suitable for thin reservoir 大庆井升伟业油田技术服务有限公司 2023-04-14 CN claimed
EP-1373980-B1 HIGH PERFORMANCE, PHOTOIMAGEABLE RESIN COMPOSITIONS AND PRINTING PLATES PREPARED THEREFROM NAPP SYSTEMS INC (US) 2012-05-09 EP claimed
US-20030175622-A1 High performance, photoimageable resin compositions and printing plates prepared therefrom NAPP SYSTEMS, INC. 2003-09-18 US claimed
US-6579664-B2 A high performance, photoimageable resin consists of a copolymer of conjugated aliphatic diene, alpha-beta unsaturated carboxylic acid, sulfonic acid, phosphoric acid, amine and ammonium chloride; a polyfunctional acrylate NAPP SYSTEMS, INC. 2003-06-17 US claimed
US-20020172875-A1 High performance, photoimageable resin compositions and printing plates prepared therefrom CITIBANK, N.A. 2002-11-21 US claimed
CN-115961914-B One-dose multifunctional online blocking removal process suitable for thin-difference reservoir 大庆井升伟业油田技术服务有限公司 2023-08-29 CN disclosed
CN-115961914-A One-dose-multipotent online plug removal process suitable for thin reservoir 大庆井升伟业油田技术服务有限公司 2023-04-14 CN disclosed
EP-1373980-B1 HIGH PERFORMANCE, PHOTOIMAGEABLE RESIN COMPOSITIONS AND PRINTING PLATES PREPARED THEREFROM NAPP SYSTEMS INC (US) 2012-05-09 EP disclosed
EP-1373980-A4 HIGH PERFORMANCE, PHOTOIMAGEABLE RESIN COMPOSITIONS AND PRINTING PLATES PREPARED THEREFROM NAPP SYSTEMS INC (US) 2007-12-05 EP disclosed
US-6780566-B2 RELIEF IMAGE PRINTING PLATES; PHOTOPOLYMERIZATION NAPP SYSTEMS, INC. 2004-08-24 US disclosed
WO-2004069916-A2 PHOTO-IMAGEABLE NANOCOMPOSITES NAPP SYSTEMS, INC. (US) 2004-08-19 WO disclosed
US-20040146806-A1 Photo-imageable nanocomposites NAPP SYSTEMS, INC. 2004-07-29 US disclosed
EP-1373980-A1 HIGH PERFORMANCE, PHOTOIMAGEABLE RESIN COMPOSITIONS AND PRINTING PLATES PREPARED THEREFROM Napp Systems, Inc. (US) 2004-01-02 EP disclosed
US-20030175622-A1 High performance, photoimageable resin compositions and printing plates prepared therefrom NAPP SYSTEMS, INC. 2003-09-18 US disclosed
US-6579664-B2 A high performance, photoimageable resin consists of a copolymer of conjugated aliphatic diene, alpha-beta unsaturated carboxylic acid, sulfonic acid, phosphoric acid, amine and ammonium chloride; a polyfunctional acrylate NAPP SYSTEMS, INC. 2003-06-17 US disclosed
US-20020172875-A1 High performance, photoimageable resin compositions and printing plates prepared therefrom CITIBANK, N.A. 2002-11-21 US disclosed
WO-2002079879-A1 HIGH PERFORMANCE, PHOTOIMAGEABLE RESIN COMPOSITIONS AND PRINTING PLATES PREPARED THEREFROM NAPP SYSTEMS, INC. (US) 2002-10-10 WO disclosed