SCHEMBL2713684

SCHEMBL2713684

CON(C)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL27569680 0.95
Cyclopropane SCHEMBL28063303 0.87
Benzene SCHEMBL27738122 0.83
SCHEMBL15506099 0.80
SCHEMBL28146312 0.75
SCHEMBL8272508 0.74
SCHEMBL18133355 0.74
SCHEMBL28063369 0.73 DPP4 (0.31)
SCHEMBL805280 0.71
SCHEMBL15506100 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104903794-B Stripper composition for removing photoresist and stripping method of photoresist using the same 株式会社LG化学 2019-07-05 CN claimed
CN-109254507-A Photoresist release agent and photoresist stripping means 苏州恒康新材料有限公司 2019-01-22 CN claimed
CN-105143984-B Stripper composition for removing photoresist and method for stripping photoresist using the same 株式会社LG化学 2017-09-05 CN claimed
CN-105143984-A Stripper composition for removing photoresist and method for stripping photoresist using the same LG CHEMICAL LTD 2015-12-09 CN claimed
CN-105017177-A Method for catalyzing epoxidation of cyclooctene by calixarene ammonium salt of perrhenic acid UNIV LIAONING SHIHUA 2015-11-04 CN claimed
CN-104903794-A Stripper composition for removing photoresist and stripping method of photoresist using the same LG CHEMICAL LTD 2015-09-09 CN claimed
US-20240148885-A1 TARGETED BIFUNCTIONAL DEGRADERS NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT 2024-05-09 US disclosed
CN-104903794-B Stripper composition for removing photoresist and stripping method of photoresist using the same 株式会社LG化学 2019-07-05 CN disclosed
CN-109254507-A Photoresist release agent and photoresist stripping means 苏州恒康新材料有限公司 2019-01-22 CN disclosed
CN-105143984-B Stripper composition for removing photoresist and method for stripping photoresist using the same 株式会社LG化学 2017-09-05 CN disclosed
CN-103044645-B Preparation low viscosity, the method for the emulsible allophanate with radiation curable groups of water 湛新 IP 有限公司 2016-12-21 CN disclosed
CN-106062638-A Method for recovering waste photoresist stripper 株式会社LG化学 2016-10-26 CN disclosed
EP-2630144-B1 RHO KINASE INHIBITORS BOEHRINGER INGELHEIM INT (DE) 2016-09-07 EP disclosed
US-7759459-B2 Fluorescent assays for protein kinases ALBERT EINSTEIN COLLEGE OF MEDICINE OF YESHIVA UNIVERSITY (US) 2010-07-20 US disclosed
CN-100436500-C Preparation process of soft foamed polyurethane TOSO KK (JP) 2008-11-26 CN disclosed
US-20050054024-A1 Fluorescent assays for protein kinases NATIONAL INSTITUTES OF HEALTH 2005-03-10 US disclosed
WO-2004062475-A2 FLUORESCENT ASSAYS FOR PROTEIN KINASES ALBERT EINSTEIN COLLEGE OF MEDICINE OF YESHIVA UNIVERSITY (US) 2004-07-29 WO disclosed
CN-1417244-A Preparation process of soft foamed polyurethane TOSO KK (JP) 2003-05-14 CN disclosed
CN-1413213-A Azaindoles AVENTIS PHARMA LTD (GB) 2003-04-23 CN disclosed
US-4798619-A 2-(2-imidazolin-2-yl)-pyridines and quinolines and use of said compounds as herbicidal agents AMERICAN CYANAMID CO. (US) 1989-01-17 US disclosed