SCHEMBL2724801

SCHEMBL2724801

O=S(=O)(O)CC(Cl)S(=O)(=O)O

nearest known ligand 0.40

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
SLC22A6 Q4U2R8 2/20 0.40
GABBR2 O75899 1/20 0.32
GABBR1 Q9UBS5 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4104006 0.75 SLC22A6 (0.43) SLC22A6GABBR2GABBR1
SCHEMBL3126508 0.75
SCHEMBL16174829 0.73 SLC22A6 (0.42) SLC22A6
SCHEMBL973895 0.73
SCHEMBL18796367 0.73
SCHEMBL16174873 0.73 SLC22A6 (0.42) SLC22A6
SCHEMBL931574 0.71
SCHEMBL4972603 0.71
SCHEMBL29205706 0.71
SCHEMBL1066718 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7714064-B2 Controllable and rapid solubility rate of water-soluble polymeric films HARBIN LONGYI NEW MATERIAL TECHNOLOGY CO. LTD. (CN) 2010-05-11 US claimed
US-20080097029-A1 CONTROLLABLE AND RAPID SOLUBILITY RATE OF WATER-SOLUBLE POLYMERIC FILMS HARBIN LONGYI NEW MATERIAL TECHNOLOGY CO. LTD. (CN) 2008-04-24 US claimed
US-20040204543-A1 Controllable and rapid solubility rate of water-soluble polymeric films YANG THOMAS P (CA) 2004-10-14 US claimed
EP-0452471-B1 PROTECTION OF LEAD-CONTAINING ANODES DURING CHROMIUM ELECTROPLATING ATOTECH USA INC (US) 1997-03-12 EP claimed
EP-0130488-A2 Presensitized lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 1985-01-09 EP claimed
US-10113099-B2 High pressure high temperature (HPHT) aqueous drilling mud composition and process for preparing the same ISP INVESTMENTS LLC (US) 2018-10-30 US disclosed
US-10023782-B2 Salt-tolerant, thermally-stable rheology modifiers ISP INVESTMENTS LLC (US) 2018-07-17 US disclosed
US-20170335162-A1 SALT-TOLERANT, THERMALLY-STABLE RHEOLOGY MODIFIERS HERCULES LLC 2017-11-23 US disclosed
US-9611416-B2 Salt-tolerant, thermally-stable rheology modifiers ISP INVESTMENTS LLC (US) 2017-04-04 US disclosed
US-20150368538-A1 A NOVEL HIGH PRESSURE HIGH TEMPERATURE (HPHT) AQUEOUS DRILLING MUD COMPOSITION AND PROCESS FOR PREPARING THE SAME ISP INVESTMENTS INC. (US) 2015-12-24 US disclosed
WO-2014133824-A1 A NOVEL HIGH PRESSURE HIGH TEMPERATURE (HPHT) AQUEOUS DRILLING MUD COMPOSITION AND PROCESS FOR PREPARING THE SAME ISP INVESTMENTS INC. (US) 2014-09-04 WO disclosed
US-20130324443-A1 SALT-TOLERANT, THERMALLY-STABLE RHEOLOGY MODIFIERS ISP INVESTMENTS INC. (US) 2013-12-05 US disclosed
EP-0092794-B1 LIGHT-SENSITIVE PRINTING PLATE FUJI PHOTO FILM CO., LTD. (JP) 1987-07-15 EP disclosed
US-4578342-A Presensitized diazo lithographic plate with anodized and silicated aluminum plate surface and subbing layer of polymer with sulfonic acid group FUJI PHOTO FILM CO., LTD. (JP) 1986-03-25 US disclosed
US-4576893-A DIAZO RESIN, PYRIDINEDICARBOXYLIC ACID FUJI PHOTO FILM CO., LTD. (JP) 1986-03-18 US disclosed
US-4557994-A MICROPATTERN OF TERPOLYMER RESISTANT TO RUBBING AND PRESSURE FUJI PHOTO FILM CO., LTD. (JP) 1985-12-10 US disclosed
EP-0130488-A2 Presensitized lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 1985-01-09 EP disclosed
EP-0110417-A2 Presensitized lithographic plate FUJI PHOTO FILM CO., LTD. (JP) 1984-06-13 EP disclosed
EP-0092794-A2 Light-sensitive printing plate FUJI PHOTO FILM CO., LTD. (JP) 1983-11-02 EP disclosed
US-4296234-A CONSISTING OF CROSSLINKED, GELLED, IONIC STARCHES LEVER BROTHERS COMPANY (US) 1981-10-20 US disclosed