SCHEMBL272928

SCHEMBL272928

[CH2]C(O)COCCCCCCCCCCCCCCCCCC

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
USP2 O75604 1/20 0.62
HTT P42858 2/20 0.60
SPHK1 Q9NYA1 1/20 0.55
LPAR5 Q9H1C0 4/20 0.51
MEN1 O00255 1/20 0.48
THRB P10828 1/20 0.48
KMT2A Q03164 1/20 0.48
MAPT P10636 1/20 0.48
LPAR1 Q92633 7/20 0.47
LPAR3 Q9UBY5 7/20 0.47
LPAR2 Q9HBW0 4/20 0.47
LPAR6 P43657 3/20 0.47
LPAR4 Q99677 3/20 0.47
PLA2G2C Q5R387 1/20 0.46
CES2 O00748 1/20 0.45
PRKD3 O94806 1/20 0.44
PRKCG P05129 1/20 0.44
PRKCB P05771 1/20 0.44
PRKCA P17252 1/20 0.44
PRKCH P24723 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3295901 1.00 USP2 (0.62) USP2HTTSPHK1LPAR5MEN1
SCHEMBL4933530 1.00 USP2 (0.62) USP2HTTSPHK1LPAR5MEN1
SCHEMBL4930230 1.00 USP2 (0.62) USP2HTTSPHK1LPAR5MEN1
SCHEMBL8756384 1.00 USP2 (0.62) USP2HTTSPHK1LPAR5MEN1
SCHEMBL4930730 1.00 USP2 (0.62) USP2HTTSPHK1LPAR5MEN1
SCHEMBL4932566 1.00 USP2 (0.62) USP2HTTSPHK1LPAR5MEN1
SCHEMBL4927093 1.00 USP2 (0.62) USP2HTTSPHK1LPAR5MEN1
SCHEMBL4931890 1.00 USP2 (0.62) USP2HTTSPHK1LPAR5MEN1
SCHEMBL4926580 1.00 USP2 (0.62) USP2HTTSPHK1LPAR5MEN1
SCHEMBL8756462 1.00 USP2 (0.62) USP2HTTSPHK1LPAR5MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0463485-B1 Process for the production of flexographic relief printing plates BASF AG (DE) 1997-05-02 EP claimed
EP-0316618-B1 Multilayer flat light sensitive registration material BASF AG (DE) 1994-08-17 EP claimed
US-5035981-A Having a top layer of high-strength, transparent, soluble or swellable polymer containing an antistatic agent of an ethoxylated amine or amide; exposure; development BASF AKTIENGESELLSCHAFT (DE) 1991-07-30 US claimed
US-4946758-A RELIEF IMAGE FORMING LAYER; HIGH TENSILE STRENGTH POLYMER AND COVERING BASF AKTIENGESELLSCHAFT (DE) 1990-08-07 US claimed
CN-112384520-B Method for producing oligonucleotide compound 日本新药株式会社 2024-06-11 CN disclosed
CN-109843055-B Method for inhibiting penetration of pest repellent into skin and penetration inhibitor for inhibiting penetration of pest repellent into skin 阿斯制药株式会社 2022-06-10 CN disclosed
CN-114507366-A Membrane with hydrophobically modified cellulose fibers and oil 花王株式会社 2022-05-17 CN disclosed
CN-110337475-B Membrane with hydrophobically modified cellulose fibers and oil 花王株式会社 2022-03-11 CN disclosed
CN-107249322-B Method for inhibiting penetration of pest repellent into skin and penetration inhibitor for inhibiting penetration of pest repellent into skin 阿斯制药株式会社 2021-10-26 CN disclosed
CN-106154749-B Photosensitive resin composition for sandblasting and sandblasting method 三菱制纸株式会社 2021-10-12 CN disclosed
US-11136416-B2 Rubber composition KAO CORPORATION (JP) 2021-10-05 US disclosed
CN-113382967-A Nanomeds for removing contaminants from aqueous solutions, kits therefor, and methods of use thereof 碳纳米技术公司 2021-09-10 CN disclosed
WO-1996039839-A1 IODINE COMPLEX OF ALKYL POLYGLYCOSIDES HENKEL CORPORATION (US) 1996-12-19 WO disclosed
EP-0316618-B1 Multilayer flat light sensitive registration material BASF AG (DE) 1994-08-17 EP disclosed
US-5240815-A Exposing photopolymerizable component to actinic light, development BASF AKTIENGESELLSCHAFT (DE) 1993-08-31 US disclosed
EP-0463485-A2 Process for the production of flexographic relief printing plates BASF Aktiengesellschaft (DE) 1992-01-02 EP disclosed
EP-0457672-A1 Toiletry preparation SHIN-ETSU CHEMICAL CO., LTD. (JP) 1991-11-21 EP disclosed
US-5035981-A Having a top layer of high-strength, transparent, soluble or swellable polymer containing an antistatic agent of an ethoxylated amine or amide; exposure; development BASF AKTIENGESELLSCHAFT (DE) 1991-07-30 US disclosed
US-4946758-A RELIEF IMAGE FORMING LAYER; HIGH TENSILE STRENGTH POLYMER AND COVERING BASF AKTIENGESELLSCHAFT (DE) 1990-08-07 US disclosed
EP-0316618-A2 Multilayer flat light sensitive registration material BASF Aktiengesellschaft (DE) 1989-05-24 EP disclosed