Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 8/20 | 0.57 |
| ▸ | CA2 | P00918 | 8/20 | 0.57 |
| ▸ | CA12 | O43570 | 7/20 | 0.57 |
| ▸ | CA7 | P43166 | 7/20 | 0.57 |
| ▸ | CA9 | Q16790 | 7/20 | 0.57 |
| ▸ | CA14 | Q9ULX7 | 7/20 | 0.57 |
| ▸ | TYR | P14679 | 1/20 | 0.57 |
| ▸ | ALDH5A1 | P51649 | 1/20 | 0.50 |
| ▸ | ABAT | P80404 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.46 |
| ▸ | MAPT | P10636 | 3/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydroquinone SCHEMBL27623035 | 1.00 | CA1 (0.57) | CA1CA2CA12CA7CA9 | |
| 4-Vinylphenol SCHEMBL482612 | 0.90 | CA1 (0.58) | CA1CA2CA12CA7CA9 | |
| Phenol SCHEMBL27502578 | 0.90 | CA12 (0.47) | CA1CA2CA12CA7CA9 | |
| Phenol SCHEMBL11827525 | 0.90 | CA12 (0.47) | CA1CA2CA12CA7CA9 | |
| Methylparaben SCHEMBL10881334 | 0.89 | CA1 (0.71) | CA1CA2CA12CA7CA9 | |
| Phenol SCHEMBL28255489 | 0.88 | CA12 (0.46) | CA1CA2CA12CA7CA9 | |
| Phenol SCHEMBL28112674 | 0.88 | CA12 (0.46) | CA1CA2CA12CA7CA9 | |
| Bisphenol A SCHEMBL28112230 | 0.87 | ESR1 (0.55) | CA1CA2CA12CA7CA9 | |
| Acrylic Acid Methyl Ester SCHEMBL9108 | 0.83 | — | — | |
| Acrylic Acid Methyl Ester SCHEMBL1854813 | 0.83 | HCAR2 (0.56) | ALDH1A1TP53HPGDHSD17B10KEAP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113956156-B | Synthetic method of hydroquinone mono (methyl) acrylate | 重庆沃肯精细化工有限公司 | 2022-08-12 | — | — | CN | claimed |
| CN-113956156-A | Synthetic method of hydroquinone mono (methyl) acrylate | 重庆沃肯精细化工有限公司 | 2022-01-21 | — | — | CN | claimed |
| CN-113956156-B | Synthetic method of hydroquinone mono (methyl) acrylate | 重庆沃肯精细化工有限公司 | 2022-08-12 | — | — | CN | disclosed |
| CN-113956156-B | Synthetic method of hydroquinone mono (methyl) acrylate | 重庆沃肯精细化工有限公司 | 2022-08-12 | — | — | CN | disclosed |
| CN-113956156-B | Synthetic method of hydroquinone mono (methyl) acrylate | 重庆沃肯精细化工有限公司 | 2022-08-12 | — | — | CN | disclosed |
| CN-113956156-A | Synthetic method of hydroquinone mono (methyl) acrylate | 重庆沃肯精细化工有限公司 | 2022-01-21 | — | — | CN | disclosed |
| CN-113956156-A | Synthetic method of hydroquinone mono (methyl) acrylate | 重庆沃肯精细化工有限公司 | 2022-01-21 | — | — | CN | disclosed |
| CN-113956156-A | Synthetic method of hydroquinone mono (methyl) acrylate | 重庆沃肯精细化工有限公司 | 2022-01-21 | — | — | CN | disclosed |
| CN-101982808-B | Chemically amplified resist composition and pattern forming process | SHINETSU CHEMICAL CO | 2013-06-26 | — | — | CN | disclosed |
| CN-101258018-B | Film forming composition for nanoimprinting and method for pattern formation | TOKYO OHKA KOGYO CO LTD | 2013-03-06 | — | — | CN | disclosed |
| CN-102453354-A | Pigment dispersion, preparation method thereof, pigment photoresist and color filter | SHENZHEN HUILE PHOTOELECTRIC CO LTD | 2012-05-16 | — | — | CN | disclosed |
| CN-101681758-A | Method for manufacturing plasma display panel | PANASONIC CORP | 2010-03-24 | — | — | CN | disclosed |
| CN-101258018-A | Film forming composition for nanoimprinting and method for pattern formation | TOKYO OHKA KOGYO CO LTD (JP) | 2008-09-03 | — | — | CN | disclosed |
| CN-1323852-C | Original edition of lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2007-07-04 | — | — | CN | disclosed |
| CN-1928714-A | Black photosensitive resin composition | TOKYO OHKA KOGYO CO LTD (JP) | 2007-03-14 | — | — | CN | disclosed |
| CN-1650230-A | Photocurable composition containing reactive particles | HUNTSMAN ADV MAT SWITZERLAND (CH) | 2005-08-03 | — | — | CN | disclosed |
| CN-1511712-A | Original edition of lithographic printing plate | 富士胶片株式会社 | 2004-07-14 | — | — | CN | disclosed |
| CN-1067319-A | Form the method for the stable hologram of light | DU PONT (US) | 1992-12-23 | — | — | CN | disclosed |
| CN-1035364-A | PHOTOPOLYMERIZABLE COMPOSITIONS AND ELEMENTS FOR REFRACTIVE INDEX IMAGING | DU PONT (US) | 1989-09-06 | — | — | CN | disclosed |
| CN-1035004-A | The refractive index imaging photopolymerization material of stable storage | DU PONT (US) | 1989-08-23 | — | — | CN | disclosed |