⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2732422 | 0.80 | — | — | |
| SCHEMBL1111012 | 0.76 | — | — | |
| SCHEMBL77943 | 0.74 | — | — | |
| SCHEMBL11630875 | 0.73 | — | — | |
| SCHEMBL14534759 | 0.73 | — | — | |
| SCHEMBL31040517 | 0.70 | — | — | |
| SCHEMBL13932635 | 0.70 | — | — | |
| SCHEMBL1038317 | 0.70 | — | — | |
| SCHEMBL9938132 | 0.70 | — | — | |
| SCHEMBL2563802 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250069948-A1 | DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS | LAM RESEARCH CORPORATION (US) | 2025-02-27 | — | — | US | claimed |
| EP-4448831-A1 | DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS | Lam Research Corporation (US) | 2024-10-23 | — | — | EP | claimed |
| CN-118434908-A | Metal deposition in recessed features using halogen-containing deposition inhibitors | 朗姆研究公司 | 2024-08-02 | — | — | CN | claimed |
| WO-2023114640-A1 | DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | claimed |
| US-20260136848-A1 | DEPOSITION OF METAL-CONTAINING FILMS | LAM RES CORP (US) | 2026-05-14 | — | — | US | disclosed |
| US-20260035782-A1 | METHOD AND SYSTEM FOR DEPOSITING METAL CARBIDE ON A SUBSTRATE | ASM IP HOLDING BV (NL) | 2026-02-05 | — | — | US | disclosed |
| US-20250069948-A1 | DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS | LAM RESEARCH CORPORATION (US) | 2025-02-27 | — | — | US | disclosed |
| EP-4448831-A1 | DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS | Lam Research Corporation (US) | 2024-10-23 | — | — | EP | disclosed |
| CN-118434908-A | Metal deposition in recessed features using halogen-containing deposition inhibitors | 朗姆研究公司 | 2024-08-02 | — | — | CN | disclosed |
| WO-2024081263-A1 | DEPOSITION OF METAL-CONTAINING FILMS | LAM RESEARCH CORPORATION (US) | 2024-04-18 | — | — | WO | disclosed |
| US-11780823-B2 | Indazole-3-carboxamides and their use as Wnt/β-catenin signaling pathway inhibitors | BIOSPLICE THERAPEUTICS, INC. (US) | 2023-10-10 | — | — | US | disclosed |
| US-20230242557-A9 | PROTEASOME ACTIVITY ENHANCING COMPOUNDS | Kineta, Inc. | 2023-08-03 | — | — | US | disclosed |
| US-8088805-B2 | Inhibitors of histone deacetylase | METHYLGENE INC. (CA) | 2012-01-03 | — | — | US | disclosed |
| US-7939318-B2 | Flexible vaccine assembly and vaccine delivery platform | KENTUCKY BIOPROCESSING, LLC (US) | 2011-05-10 | — | — | US | disclosed |
| US-20100149446-A1 | POLYMER-STABILIZED LIQUID CRYSTAL COMPOSITION, LIQUID CRYSTAL DISPLAY DEVICE, METHOD FOR PRODUCING LIQUID CRYSTAL DISPLAY DEVICE | DIC CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20100044874-A1 | INTEGRATED CIRCUIT OF DECREASED SIZE | STMICROELECTRONICS (ROUSSET) SAS (FR) | 2010-02-25 | — | — | US | disclosed |
| WO-2008076427-A2 | NAPHTHALENONE COMPOUNDS EXHIBITING PROLYL HYDROXYLASE INHIBITORY ACTIVITY, COMPOSITIONS, AND USES THEREOF | AMGEN INC. (US) | 2008-06-26 | — | — | WO | disclosed |
| EP-0919870-B1 | Photosensitive resin composition and photosensitive element using the resin composition | NICHIGO MORTON CO LTD (JP) | 2002-07-03 | — | — | EP | disclosed |
| US-6242158-B1 | POLYMER WITH CARBOXY DERIVATIVES, ETHYLENE AND ACRYLIC ESTER DERIVATIVES | NICHIGO-MORTON CO., LTD. (JP) | 2001-06-05 | — | — | US | disclosed |
| EP-0919870-A1 | Photosensitive resin composition and photosensitive element using the resin composition | Nichigo-Morton Co Ltd (JP) | 1999-06-02 | — | — | EP | disclosed |