SCHEMBL27344461

SCHEMBL27344461

CC1(OC(=O)COc2ccc(S(I)(c3ccccc3)c3ccccc3)cc2)CCCC1

nearest known ligand 0.41

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.41
CYP19A1 P11511 1/20 0.40
GAA P10253 2/20 0.39
NPSR1 Q6W5P4 1/20 0.39
ATM Q13315 1/20 0.39
ALDH1A1 P00352 4/20 0.38
PKM P14618 4/20 0.38
POLB P06746 1/20 0.38
GLA P06280 1/20 0.38
L3MBTL1 Q9Y468 2/20 0.37
AGTR1 P30556 1/20 0.37
RECQL P46063 1/20 0.37
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
TSHR P16473 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23600701 0.89 CYP19A1 (0.40) MAPTCYP19A1GAANPSR1ATM
SCHEMBL27259451 0.86 MEN1 (0.49) MAPTCYP19A1GAAALDH1A1POLB
SCHEMBL25689780 0.81 CYP19A1 (0.42) MAPTCYP19A1GAAALDH1A1POLB
SCHEMBL12997501 0.81 CYP19A1 (0.42) MAPTCYP19A1ALDH1A1POLBL3MBTL1
SCHEMBL12997503 0.80 CYP19A1 (0.44) MAPTCYP19A1GAAALDH1A1POLB
Hydrochloric Acid SCHEMBL31564947 0.80 CYP19A1 (0.44) MAPTCYP19A1ALDH1A1POLBL3MBTL1
SCHEMBL27416476 0.78 CYP19A1 (0.42) MAPTCYP19A1ALDH1A1POLBGLA
SCHEMBL12997495 0.76 CYP19A1 (0.44) MAPTCYP19A1GAANPSR1ALDH1A1
SCHEMBL9627685 0.74 CYP19A1 (0.43) CYP19A1GAANPSR1ALDH1A1POLB
SCHEMBL12997497 0.74 CYP19A1 (0.46) CYP19A1GAAALDH1A1POLBGLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024143131-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ONIUM SALT 富士フイルム株式会社 2024-07-04 WO disclosed