⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11915745 | 1.00 | — | — | |
| SCHEMBL10044221 | 0.78 | — | — | |
| SCHEMBL10044216 | 0.78 | — | — | |
| SCHEMBL18136580 | 0.78 | — | — | |
| SCHEMBL19630929 | 0.78 | TSHR (0.31) | — | |
| SCHEMBL28220291 | 0.77 | — | — | |
| SCHEMBL2738465 | 0.76 | — | — | |
| SCHEMBL21725567 | 0.76 | — | — | |
| SCHEMBL2519123 | 0.76 | — | — | |
| SCHEMBL21813317 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2970176-B1 | MOLECULES HAVING CERTAIN PESTICIDAL UTILITIES, AND INTERMEDIATES, COMPOSITIONS, AND PROCESSES RELATED THERETO | CORTEVA AGRISCIENCE LLC (US) | 2023-10-25 | — | — | EP | disclosed |
| US-20210189152-A1 | Anti-smudge and Anti-graffiti Compositions | QUEEN'S UNIVERSITY AT KINGSTON (CA) | 2021-06-24 | — | — | US | disclosed |
| US-20160178816-A1 | NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT FILTER OBTAINED USING SAME, PROCESS FOR PRODUCING SAID CUT FILTER, CAMERA MODULE AND PROCESS FOR PRODUCING SAME, AND SOLID PHOTOGRAPHING ELEMENT | FUJIFILM CORPORATION (JP) | 2016-06-23 | — | — | US | disclosed |
| US-9365545-B2 | Therapeutic compounds and compositions | AGIOS PHARMACEUTICALS, INC (US) | 2016-06-14 | — | — | US | disclosed |
| US-20150336931-A1 | THERAPEUTIC COMPOUNDS AND COMPOSITIONS | AGIOS PHARMACEUTICALS, INC | 2015-11-26 | — | — | US | disclosed |
| US-9108921-B2 | Therapeutic compounds and compositions | AGIOS PHARMACEUTICALS, INC (US) | 2015-08-18 | — | — | US | disclosed |
| US-9081279-B2 | Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2015-07-14 | — | — | US | disclosed |
| US-20140288081-A1 | THERAPEUTIC COMPOUNDS AND COMPOSITIONS | AGIOS PHARMACEUTICALS, INC (US) | 2014-09-25 | — | — | US | disclosed |
| WO-2014139325-A1 | THERAPEUTIC COMPOUNDS AND COMPOSITIONS | AGIOS PHARMACEUTICALS, INC. (US) | 2014-09-18 | — | — | WO | disclosed |
| US-8785104-B2 | Resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-07-22 | — | — | US | disclosed |
| US-20110143280-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2011-06-16 | — | — | US | disclosed |
| CN-102036943-A | Preparation of a catalyst containing CF3Method for preparing compounds of O group | MERCK PATENT GMBH | 2011-04-27 | — | — | CN | disclosed |
| US-20110020755-A1 | METHOD OF FORMING PATTERNS | FUJIFILM CORPORATION (JP) | 2011-01-27 | — | — | US | disclosed |
| US-20110014570-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20100183978-A1 | SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN FORMING METHOD USING THE TREATING AGENT | FUJIFILM CORPORATION (JP) | 2010-07-22 | — | — | US | disclosed |
| US-20100068661-A1 | PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| WO-2009064486-A2 | INHIBITORS OF PIM PROTEIN KINASES, COMPOSITIONS, AND METHODS FOR TREATING CANCER | MUSC FOUNDATION FOR RESEARCH DEVELOPMENT (US) | 2009-05-22 | — | — | WO | disclosed |
| US-7455952-B2 | Patterning process and resist overcoat material | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-11-25 | — | — | US | disclosed |
| US-20080248421-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080241742-A1 | SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING METHOD USING THE SURFACE-TREATING AGENT | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |