SCHEMBL27352190

SCHEMBL27352190

CC(C)OC(=O)CC[C@H](C)C1CCC2C3CC[C@H]4C[C@@H](O)CC[C@@]4(C)[C@@H]3C[C@@H](O)[C@]21C

nearest known ligand 0.84

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 2/20 0.84
▸ MEN1 O00255 2/20 0.84
▸ KMT2A Q03164 2/20 0.84
▸ USP2 O75604 2/20 0.84
▸ MAPK1 P28482 2/20 0.84
▸ LMNA P02545 1/20 0.84
▸ GPBAR1 Q8TDU6 8/20 0.79
▸ SLC10A2 Q12908 2/20 0.79
▸ TBXA2R P21731 1/20 0.79
▸ PDE3A Q14432 1/20 0.79
▸ NR1H4 Q96RI1 1/20 0.79
▸ ABCC4 O15439 1/20 0.66
▸ CA1 P00915 3/20 0.66
▸ CA2 P00918 3/20 0.66
▸ CYP2C9 P11712 1/20 0.66
▸ HIF1A Q16665 1/20 0.66
▸ VDR P11473 1/20 0.66
▸ CYP3A4 P08684 2/20 0.63
▸ SLCO1B3 Q9NPD5 1/20 0.63
▸ SLCO1B1 Q9Y6L6 1/20 0.63

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21283699 1.00 MAPT (0.84) MAPTMEN1KMT2AUSP2MAPK1
SCHEMBL21283703 1.00 MAPT (0.84) MAPTMEN1KMT2AUSP2MAPK1
SCHEMBL5442896 0.94 MAPT (0.77) MAPTMEN1KMT2AUSP2MAPK1
SCHEMBL27352374 0.92 MAPT (0.80) MAPTMEN1KMT2AUSP2MAPK1
SCHEMBL5437613 0.92 MAPT (0.80) MAPTMEN1KMT2AUSP2MAPK1
Methyl Deoxycholate SCHEMBL16728288 0.91 MAPT (1.00) MAPTMEN1KMT2AUSP2MAPK1
Methyl Deoxycholate SCHEMBL21846440 0.91 MAPT (1.00) MAPTMEN1KMT2AUSP2MAPK1
Methyl Deoxycholate SCHEMBL14668286 0.91 MAPT (1.00) MAPTMEN1KMT2AUSP2MAPK1
Methyl Deoxycholate SCHEMBL21283695 0.91 MAPT (1.00) MAPTMEN1KMT2AUSP2MAPK1
Methyl Deoxycholate SCHEMBL13851607 0.91 MAPT (1.00) MAPTMEN1KMT2AUSP2MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024024490-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM 日産化学株式会社 2024-02-01 — — WO disclosed
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