⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Aluminum Chloride Anhydrous SCHEMBL29104163 | 1.00 | — | — | |
| Aluminum Chloride Anhydrous SCHEMBL1565 | 1.00 | — | — | |
| Aluminum Chloride Anhydrous SCHEMBL28381460 | 1.00 | — | — | |
| Aluminum Chloride Anhydrous SCHEMBL173372 | 0.89 | — | — | |
| Aluminum Chloride Anhydrous SCHEMBL21419730 | 0.89 | — | — | |
| Aluminum Chloride Anhydrous SCHEMBL22228666 | 0.89 | — | — | |
| Aluminum Chloride Anhydrous SCHEMBL19181043 | 0.89 | — | — | |
| Aluminum Chloride Anhydrous SCHEMBL20362180 | 0.89 | — | — | |
| Aluminum Chloride Anhydrous SCHEMBL22288088 | 0.89 | — | — | |
| Aluminum Chloride Anhydrous SCHEMBL21074259 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4711337-A1 | METHOD FOR SYNTHESISING ACTINIDE CHLORIDE(S) FROM ACTINIDE OXIDE(S) PRESENT IN A MOLTEN SALT | Naarea (FR) | 2026-03-18 | — | — | EP | claimed |
| US-12482628-B2 | Chlorine-containing precursors for ion implantation systems and related methods | ENTEGRIS, INC. (US) | 2025-11-25 | — | — | US | claimed |
| WO-2025235300-A1 | CORROSION-SUSCEPTIBLE BONDING LAYER IN ASSISTING SEMICONDUCTOR WAFER DEBONDING | MICRON TECHNOLOGY, INC. (US) | 2025-11-13 | — | — | WO | claimed |
| US-20250346028-A1 | CORROSION-SUSCEPTIBLE BONDING LAYER IN ASSISTING SEMICONDUCTOR WAFER DEBONDING | MICRON TECHNOLOGY INC (US) | 2025-11-13 | — | — | US | claimed |
| CN-119856270-A | Chlorine-containing precursors for ion implantation systems and related methods | 恩特格里斯公司 | 2025-04-18 | — | — | CN | claimed |
| CN-112397555-B | Organic light emitting diode display | 三星显示有限公司 | 2025-03-25 | — | — | CN | claimed |
| US-20240062987-A1 | CHLORINE-CONTAINING PRECURSORS FOR ION IMPLANTATION SYSTEMS AND RELATED METHODS | ENTEGRIS, INC. | 2024-02-22 | — | — | US | claimed |
| US-11634338-B1 | Process for producing aluminum chlorohydrate particles | USALCO, LLC (US) | 2023-04-25 | — | — | US | claimed |
| US-20260125801-A1 | COATINGS FOR ENHANCEMENT OF PROPERTIES AND PERFORMANCE OF SUBSTRATE ARTICLES AND APPARATUS | ENTEGRIS INC (US) | 2026-05-07 | — | — | US | disclosed |
| EP-4711337-A1 | METHOD FOR SYNTHESISING ACTINIDE CHLORIDE(S) FROM ACTINIDE OXIDE(S) PRESENT IN A MOLTEN SALT | Naarea (FR) | 2026-03-18 | — | — | EP | disclosed |
| EP-4712104-A1 | USE OF OXOACID REDUCTANT IN THE MOLTEN SALTS FOR A NUCLEAR FISSION (RSF) REACTOR | Naarea (FR) | 2026-03-18 | — | — | EP | disclosed |
| US-12482628-B2 | Chlorine-containing precursors for ion implantation systems and related methods | ENTEGRIS, INC. (US) | 2025-11-25 | — | — | US | disclosed |
| WO-2025235300-A1 | CORROSION-SUSCEPTIBLE BONDING LAYER IN ASSISTING SEMICONDUCTOR WAFER DEBONDING | MICRON TECHNOLOGY, INC. (US) | 2025-11-13 | — | — | WO | disclosed |
| US-20250346028-A1 | CORROSION-SUSCEPTIBLE BONDING LAYER IN ASSISTING SEMICONDUCTOR WAFER DEBONDING | MICRON TECHNOLOGY INC (US) | 2025-11-13 | — | — | US | disclosed |
| CN-101213330-A | Ceramic fibre and manufacturing method thereof | TEIJIN LTD (JP) | 2008-07-02 | — | — | CN | disclosed |
| CN-101208267-A | Method for producing high-purity silicon | SUMITOMO CHEMICAL CO (JP) | 2008-06-25 | — | — | CN | disclosed |
| CN-1190363-C | Process for preparing both sodium carbonate and silica white | YE TIANRUN (CN) | 2005-02-23 | — | — | CN | disclosed |
| CN-1061659-C | Process for converting high-boiling residue from direct process to monosilanes | DOW CORNING (US) | 2001-02-07 | — | — | CN | disclosed |
| CN-1172114-A | Process for converting high-boiling residue from direct process to monosilanes | DOW CORNING (US) | 1998-02-04 | — | — | CN | disclosed |
| CN-1090223-A | A kind of liquid aluminum trichloride catalyst and preparation technology thereof | YONGXIN SHENYANG CHEMICAL CO L (CN) | 1994-08-03 | — | — | CN | disclosed |