⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL789350 | 0.77 | — | — | |
| SCHEMBL2315985 | 0.74 | — | — | |
| SCHEMBL10940093 | 0.74 | — | — | |
| SCHEMBL2316780 | 0.74 | — | — | |
| SCHEMBL24385960 | 0.74 | — | — | |
| SCHEMBL1469905 | 0.74 | TET2 (0.56) | — | |
| SCHEMBL2757916 | 0.71 | — | — | |
| SCHEMBL276451 | 0.71 | — | — | |
| SCHEMBL23190258 | 0.70 | TSHR (0.33) | — | |
| SCHEMBL13806562 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8551684-B2 | Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2013-10-08 | — | — | US | disclosed |
| US-20120003589-A1 | POLYMER FOR FORMING RESIST PROTECTION FILM, COMPOSITION FOR FORMING RESIST PROTECTION FILM, AND METHOD OF FORMING PATTERNS OF SEMICONDUCTOR DEVICES USING THE COMPOSITION | DONGJIN SEMICHEM CO., LTD. (KR) | 2012-01-05 | — | — | US | disclosed |