⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylene SCHEMBL27328604 | 0.95 | — | — | |
| Ethylene SCHEMBL27532353 | 0.90 | — | — | |
| Ethylene SCHEMBL28252998 | 0.90 | TSHR (0.46) | — | |
| Ethylene SCHEMBL27532035 | 0.90 | — | — | |
| Ethylene SCHEMBL27315031 | 0.90 | — | — | |
| SCHEMBL5823722 | 0.89 | — | — | |
| SCHEMBL968936 | 0.89 | — | — | |
| SCHEMBL28369313 | 0.84 | TSHR (0.50) | — | |
| SCHEMBL2295699 | 0.84 | TSHR (0.62) | — | |
| SCHEMBL21329 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1305832-C | Method for purifying acrylic acid | MITSUBISHI CHEM CORP (JP) | 2007-03-21 | — | — | CN | claimed |
| CN-1288126-C | Method for purifying acrylic acid | MITSUBISHI CHEM CORP (JP) | 2006-12-06 | — | — | CN | claimed |
| CN-1582268-A | Method for purifying acrylic acid | MITSUBISHI CHEM CORP (JP) | 2005-02-16 | — | — | CN | claimed |
| CN-1572777-A | Method for purifying acrylic acid | MITSUBISHI CHEM CORP (JP) | 2005-02-02 | — | — | CN | claimed |
| CN-1117060-C | Process for purifying acrylic acid | SUMITOMO CHEMICAL CO (JP) | 2003-08-06 | — | — | CN | claimed |
| CN-1109863-A | Process for purifying acrylic acid | SUMITOMO CHEMICAL CO (JP) | 1995-10-11 | — | — | CN | claimed |
| CN-100589861-C | Distillation apparatus for easily polymerizable compound | MITSUBISHI ELECTRIC CORP | 2010-02-17 | — | — | CN | disclosed |
| CN-101456807-A | Method for producing (methyl) acrylic acid | SHANGHAI HUAYI ACRYLIC ACID CO (CN) | 2009-06-17 | — | — | CN | disclosed |
| CN-100494155-C | Method for producing acrylic acid compound | MITSUBISHI CHEM CORP (JP) | 2009-06-03 | — | — | CN | disclosed |
| CN-100486954-C | Method for treating high-viscosity substances | MITSUBISHI CHEM CORP (JP) | 2009-05-13 | — | — | CN | disclosed |
| CN-100427451-C | Process for producing (meth) acrylic acid or (meth) acrylic ester | MITSUBISHI CHEM CORP (JP) | 2008-10-22 | — | — | CN | disclosed |
| CN-100389848-C | Thin film evaporator and application thereof in (methyl) acrylic acid refining method | MITSUBISHI CHEM CORP (JP) | 2008-05-28 | — | — | CN | disclosed |
| CN-100390112-C | Apparatus for handling easily polymerizable compound and apparatus for producing easily polymerizable compound | MITSUBISHI CHEM CORP (JP) | 2008-05-28 | — | — | CN | disclosed |
| CN-1550250-A | Distillation apparatus for easily polymerizable compound | 三菱化学株式会社 | 2004-12-01 | — | — | CN | disclosed |
| CN-1550251-A | Distillation apparatus for easily polymerizable compound | 三菱化学株式会社 | 2004-12-01 | — | — | CN | disclosed |
| CN-1550484-A | Distillation apparatus for easily polymerizable compound | 三菱化学株式会社 | 2004-12-01 | — | — | CN | disclosed |
| CN-1550249-A | Distillation apparatus for easily polymerizable compound | 三菱化学株式会社 | 2004-12-01 | — | — | CN | disclosed |
| CN-1480443-A | Prepn. process for fined acroleic acid | 住友化学工业株式会社 | 2004-03-10 | — | — | CN | disclosed |
| CN-1117060-C | Process for purifying acrylic acid | SUMITOMO CHEMICAL CO (JP) | 2003-08-06 | — | — | CN | disclosed |
| CN-1109863-A | Process for purifying acrylic acid | SUMITOMO CHEMICAL CO (JP) | 1995-10-11 | — | — | CN | disclosed |