SCHEMBL27437435

SCHEMBL27437435

CC(C(=O)OC1CCCCC1)C(=O)C(C)(C)C

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 2/20 0.45
SMN1; SMN2 Q16637 3/20 0.42
HTT P42858 2/20 0.42
NPC1 O15118 2/20 0.42
RAB9A P51151 2/20 0.42
EPHX1 P07099 2/20 0.40
NAAA Q02083 2/20 0.37
L3MBTL1 Q9Y468 1/20 0.36
CYP2C19 P33261 2/20 0.34
GAA P10253 1/20 0.34
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA9 Q16790 1/20 0.33
TSHR P16473 2/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC2 Q92769 1/20 0.33
CYP3A4 P08684 1/20 0.33
ALDH1A1 P00352 1/20 0.33
ALOX15 P16050 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8984845 0.85 CYP19A1 (0.53) CYP19A1SMN1; SMN2HTTNPC1RAB9A
SCHEMBL27874692 0.82 CYP19A1 (0.50) CYP19A1HTTEPHX1NAAAL3MBTL1
SCHEMBL26939371 0.77 CYP19A1 (0.46) CYP19A1HTTEPHX1NAAAL3MBTL1
SCHEMBL21396666 0.77 HTT (0.39) CYP19A1SMN1; SMN2HTTNPC1RAB9A
SCHEMBL2182130 0.77 CYP19A1 (0.53) CYP19A1SMN1; SMN2HTTNPC1RAB9A
SCHEMBL753308 0.77 CYP19A1 (0.53) CYP19A1SMN1; SMN2HTTNPC1RAB9A
SCHEMBL26822901 0.77 CYP19A1 (0.53) CYP19A1SMN1; SMN2HTTNPC1RAB9A
SCHEMBL28317353 0.77 CYP19A1 (0.53) CYP19A1SMN1; SMN2HTTNPC1RAB9A
SCHEMBL6520398 0.76 CYP19A1 (0.46) CYP19A1HTTRAB9AEPHX1NAAA
SCHEMBL6520408 0.76 CYP19A1 (0.46) CYP19A1HTTRAB9AEPHX1NAAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed