⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19231077 | 0.89 | — | — | |
| SCHEMBL12909356 | 0.89 | — | — | |
| SCHEMBL24449166 | 0.89 | — | — | |
| SCHEMBL25894399 | 0.83 | — | — | |
| SCHEMBL15029759 | 0.82 | CHRM2 (0.33) | — | |
| SCHEMBL1662030 | 0.82 | TSHR (0.36) | — | |
| SCHEMBL25888078 | 0.81 | — | — | |
| SCHEMBL18888057 | 0.81 | MAPT (0.31) | — | |
| SCHEMBL19245732 | 0.81 | — | — | |
| SCHEMBL30839907 | 0.80 | ATM (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250109155-A1 | COMPOUND AND COLORED RESIN COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-04-03 | — | — | US | disclosed |
| CN-119689778-A | Colored curable resin composition, color filter, display device, and solid-state imaging element | 住友化学株式会社 | 2025-03-25 | — | — | CN | disclosed |
| WO-2024252985-A1 | CURABLE RESIN COMPOSITION, CURED FILM, DISPLAY DEVICE, AND SOLID-STATE IMAGING ELEMENT | 住友化学株式会社 | 2024-12-12 | — | — | WO | disclosed |
| EP-4464711-A1 | COMPOUND AND COLORED RESIN COMPOSITION | Sumitomo Chemical Company, Limited (JP) | 2024-11-20 | — | — | EP | disclosed |
| US-12140838-B2 | Barrier rib for image display device, manufacturing method therefor, and image display device comprising barrier rib | DONGWOO FINE-CHEM CO., LTD. (KR) | 2024-11-12 | — | — | US | disclosed |
| WO-2024203200-A1 | COMPOUND, COLORED RESIN COMPOSITION, COLORED CURABLE RESIN COMPOSITION, COLOR FILTER, DISPLAY DEVICE, AND SOLID-STATE IMAGING ELEMENT | 住友化学株式会社 | 2024-10-03 | — | — | WO | disclosed |
| WO-2024190527-A1 | COLORED CURABLE RESIN COMPOSITION, OPTICAL FILTER AND SOLID-STATE IMAGING ELEMENT | 住友化学株式会社 | 2024-09-19 | — | — | WO | disclosed |
| WO-2024190526-A1 | COLORED CURABLE RESIN COMPOSITION, OPTICAL FILTER, AND SOLID-STATE IMAGING ELEMENT | 住友化学株式会社 | 2024-09-19 | — | — | WO | disclosed |
| WO-2024190525-A1 | COLORED CURABLE RESIN COMPOSITION, OPTICAL FILTER, AND SOLID-STATE IMAGING ELEMENT | 住友化学株式会社 | 2024-09-19 | — | — | WO | disclosed |
| WO-2024190528-A1 | COLORING CURABLE RESIN COMPOSITION, OPTICAL FILTER, AND SOLID-STATE IMAGING ELEMENT | 住友化学株式会社 | 2024-09-19 | — | — | WO | disclosed |
| US-7977030-B2 | Photosensitive resin composition, photosensitive resin laminate, and method for pattern forming | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-07-12 | — | — | US | disclosed |
| US-7977030-B2 | Photosensitive resin composition, photosensitive resin laminate, and method for pattern forming | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-07-12 | — | — | US | disclosed |
| US-20110104596-A1 | POLYMERIZABLE COMPOSITION, LIGHT-BLOCKING COLOR FILTER FOR SOLID-STATE IMAGING DEVICE, AND SOLID-STATE IMAGING DEVICE | FUJIFILM CORPORATION (JP) | 2011-05-05 | — | — | US | disclosed |
| US-20110017962-A1 | COLORED CURABLE COMPOSITION, COLOR FILTER AND SOLID-STATE IMAGING DEVICE | FUJIFILM CORPORATION (JP) | 2011-01-27 | — | — | US | disclosed |
| WO-2010108835-A1 | PHOTORESIST COMPOSITION | BASF SE (DE) | 2010-09-30 | — | — | WO | disclosed |
| US-20100134729-A1 | COLOR FILTER INK, COLOR FILTER INK MANUFACTURING METHOD, COLOR FILTER INK SET, COLOR FILTER, IMAGE DISPLAY DEVICE, AND ELECTRONIC DEVICE | SEIKO EPSON CORPORATION (JP) | 2010-06-03 | — | — | US | disclosed |
| US-20080311511-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, AND METHOD FOR PATTERN FORMING | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20080311511-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, AND METHOD FOR PATTERN FORMING | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20070059637-A1 | Photosensitive resin composition | NIPPON PAINT CO., LTD. (JP) | 2007-03-15 | — | — | US | disclosed |
| US-20070059638-A1 | Photosensitive resin composition | NIPPON PAINT CO., LTD. (JP) | 2007-03-15 | — | — | US | disclosed |