SCHEMBL2744675

SCHEMBL2744675

O=[Te](=O)(O)O.[Ag]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11435177 0.93
SCHEMBL160573 0.93
SCHEMBL4850563 0.86
SCHEMBL219448 0.86
SCHEMBL14956325 0.86
SCHEMBL11776448 0.86
SCHEMBL4811953 0.86
Water SCHEMBL636760 0.86
SCHEMBL20530479 0.86
SCHEMBL14956847 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119170322-A Front surface slurry for TOPCon battery and preparation method and application thereof 广东科技学院 2024-12-20 CN claimed
CN-119170322-A Front surface slurry for TOPCon battery and preparation method and application thereof 广东科技学院 2024-12-20 CN disclosed
CN-108603202-A Methods for generating metal nanoparticles and metal sulfide nanoparticles using recombinant microorganisms 韩国科学技术院 2018-09-28 CN disclosed
CN-105858623-A Preparation method for silver tellurite, crystalline solar cell positive pole silver paste and preparation method therefor 苏州开元民生科技股份有限公司 2016-08-17 CN disclosed
US-8253035-B2 Plating processing method, light transmitting conductive film and electromagnetic wave shielding film FUJIFILM CORPORATION (JP) 2012-08-28 US disclosed
US-8177954-B2 Plating processing method, light-transmitting conductive film and electromagnetic wave-shielding film FUJIFILM CORPORATION (JP) 2012-05-15 US disclosed
CN-101754686-A Methods and compositions comprising high valent silver for increasing seed germination INNOVOTECH INC 2010-06-23 CN disclosed
US-20090218127-A1 PLATING PROCESSING METHOD, LIGHT-TRANSMITTING CONDUCTIVE FILM AND ELECTROMAGNETIC WAVE-SHIELDING FILM FUJIFILM CORPORATION (JP) 2009-09-03 US disclosed
CN-100534614-C Process for preparing metal oxide catalyst TOAGOSEI CO LTD (JP) 2009-09-02 CN disclosed
CN-101494987-A Methods and compositions for treating biofilms INNOVOTECH INC (CA) 2009-07-29 CN disclosed
US-20090020712-A1 PLATING PROCESSING METHOD, LIGHT TRANSMITTING CONDUCTIVE FILM AND ELECTROMAGNETIC WAVE SHIELDING FILM FUJIFILM CORPORATION (JP) 2009-01-22 US disclosed
US-7375052-B2 Process for producing metal oxide catalyst TOAGOSEI CO., LTD. (JP) 2008-05-20 US disclosed
US-20070161767-A1 Process for producing metal oxide catalyst TOAGOSEI CO., LTD. (JP) 2007-07-12 US disclosed
CN-1774295-A Method for producing metal oxide catalyst TOAGOSEI CO LTD (JP) 2006-05-17 CN disclosed
EP-1618952-A1 METHOD FOR PRODUCING METAL OXIDE CATALYST Toagosei Co., Ltd. (JP) 2006-01-25 EP disclosed