SCHEMBL274644

SCHEMBL274644

CCCCOCCOCCOCC

nearest known ligand 0.57

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.57
CYP3A4 P08684 3/20 0.54
MEN1 O00255 1/20 0.50
THRB P10828 1/20 0.50
HTT P42858 1/20 0.50
KMT2A Q03164 1/20 0.50
MAPT P10636 1/20 0.50
ALDH1A1 P00352 4/20 0.43
ADRB2 P07550 1/20 0.43
ADRB1 P08588 1/20 0.43
ADRB3 P13945 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.41
HPGD P15428 1/20 0.41
RARB P10826 1/20 0.36
CES2 O00748 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1954568 1.00 TSHR (0.57) TSHRCYP3A4MEN1THRBHTT
SCHEMBL273578 1.00 TSHR (0.57) TSHRCYP3A4MEN1THRBHTT
SCHEMBL3695089 1.00 TSHR (0.57) TSHRCYP3A4MEN1THRBHTT
SCHEMBL17394526 1.00 TSHR (0.57) TSHRCYP3A4MEN1THRBHTT
SCHEMBL2799321 1.00 TSHR (0.57) TSHRCYP3A4MEN1THRBHTT
SCHEMBL616138 1.00 TSHR (0.57) TSHRCYP3A4MEN1THRBHTT
SCHEMBL23356864 1.00 TSHR (0.57) TSHRCYP3A4MEN1THRBHTT
SCHEMBL3838219 1.00 TSHR (0.57) TSHRCYP3A4MEN1THRBHTT
SCHEMBL15023631 1.00 TSHR (0.57) TSHRCYP3A4MEN1THRBHTT
Water SCHEMBL28033915 0.97 TSHR (0.55) TSHRCYP3A4MEN1THRBHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 367 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119591780-A Photoresist additive and photoresist composition 合肥鼎材科技有限公司 2025-03-11 CN claimed
CN-110967927-B Photosensitive resin composition and display device including the same 三星显示有限公司 2025-01-28 CN claimed
CN-118084793-A Diamine monomer containing imidazole structure, and preparation method and application thereof 波米科技有限公司 2024-05-28 CN claimed
CN-108572516-B Positive photosensitive resin composition, display device and pattern forming method thereof 株式会社东进世美肯 2023-10-17 CN claimed
CN-113087843-B Polymer and photoresist composition containing same 北京鼎材科技有限公司 2023-10-13 CN claimed
CN-109960109-B Dispersing agent, photosensitive resin composition and application of dispersing agent and photosensitive resin composition 北京鼎材科技有限公司 2023-08-29 CN claimed
CN-116640479-A Ink composition for light-emitting device, and electronic apparatus 三星显示有限公司 2023-08-25 CN claimed
WO-2022145795-A1 NEGATIVE PHOTO-SENSITIVE RESIN COMPOSITION WITH LOW-TEMPERATURE CURABILITY AND LOW REFRACTIVE INDEX 주식회사 동진쎄미켐 2022-07-07 WO claimed
CN-114644740-A Fluorine-containing phenolic resin, preparation method thereof and photoresist composition adopting fluorine-containing phenolic resin 合肥鼎材科技有限公司 2022-06-21 CN claimed
WO-2022065886-A1 LOW-REFRACTIVE-INDEX THERMOSETTING COMPOSITION, OPTICAL MEMBER FORMED THEREFROM, AND DISPLAY APPARATUS 주식회사 동진쎄미켐 2022-03-31 WO claimed
CN-100473686-C Rubber composition for cleaning and stripping mould NALA CHEMICAL CO LTD (KR) 2009-04-01 CN claimed
EP-1692230-B1 RAPID DISPERSING HYDROUS KAOLINS IMERYS KAOLIN INC (US) 2008-12-31 EP claimed
US-7442488-B2 Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode SAMSUNG SDI CO., LTD. (KR) 2008-10-28 US claimed
EP-1567360-B1 SURFACE TREATMENT FOR PRINTING APPLICATIONS USING WATER-BASED INK HEWLETT PACKARD IND PRINTING (IL) 2008-06-18 EP claimed
US-20060071202-A1 Photosensitive paste composition SAMSUNG SDI CO., LTD. (KR) 2006-04-06 US claimed
US-20060073412-A1 Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode SAMSUNG SDI CO., LTD. (KR) 2006-04-06 US claimed
CN-1727387-A Rubber compsns. for cleaning and stripping mould NALA CHEMICAL CO LTD (KR) 2006-02-01 CN claimed
US-20010005736-A1 Compatabilization of internal mold release agents DEUTSCHE BANK TRUST COMPANY AMERICAS, AS AGENT 2001-06-28 US claimed
EP-1102800-A1 COMPATABILIZATION OF INTERNAL MOLD RELEASE AGENTS HUNTSMAN INTERNATIONAL LLC (US) 2001-05-30 EP claimed
WO-2000006625-A1 COMPATABILIZATION OF INTERNAL MOLD RELEASE AGENTS HUNTSMAN ICI CHEMICALS, LLC (US) 2000-02-10 WO claimed